公开(公告)号：US20150210828A1

公开(公告)日：2015-07-30

申请号：US14678314

申请日：2015-04-03

Applicant: BASF SE

Inventor： Hans-Rudolf MEIER ,  Kai-Uwe SCHOENING ,  Shrirang Bhikaji HINDALEKAR

IPC: C08K5/3435 ,  C07D211/94

CPC classification number: C08K5/3435 ,  C07D211/94 ,  C08K5/378 ,  C08L21/02

Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.

Abstract translation: 式（A）的化合物，其中基团R 1彼此独立地为甲基，乙基或正丙基，X为C 2 -C 8亚烷基或被中断的C 2 -C 8亚烷基，可用于稳定有机材料以防止由 光，热或氧化。