公开(公告)号：US20250011574A1

公开(公告)日：2025-01-09

申请号：US18693113

申请日：2022-09-16

Applicant: BASF SE

Inventor： Tania WEYLAND ,  Daniel MUELLER ,  John SIGLER ,  Heinz HERBST ,  Raphael DABBOUS

IPC: C08K5/3492 ,  C08K5/00 ,  C08K5/132 ,  C08K5/3435

Abstract: The present invention relates to a composition comprising an organic material, at least one compound of formula (A), and at least one UV absorber. Further, the present invention relates to an organic material-based article comprising at least one compound of formula (A), and at least one UV absorber. The present invention also relates to the use of at least one compound of formula (A) and at least one UV absorber for enhancing stability of the organic material exposed to light.