公开(公告)号：US11319332B2

公开(公告)日：2022-05-03

申请号：US16954341

申请日：2018-09-17

申请人： BASF SE ,  WAYNE STATE UNIVERSITY

发明人： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC分类号： C07F5/06 ,  C23C16/12 ,  C23C16/08 ,  C23C16/20 ,  C23C16/455

摘要： A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US20210079520A1

公开(公告)日：2021-03-18

申请号：US16954341

申请日：2018-09-17

申请人： BASF SE ,  WAYNE STATE UNIVERSITY

发明人： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC分类号： C23C16/20 ,  C23C16/12 ,  C23C16/455 ,  C07F5/06

摘要： Described herein is a process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US20210079025A1

公开(公告)日：2021-03-18

申请号：US16954371

申请日：2018-11-09

申请人： BASF SE ,  Wayne State University

发明人： Lukas Mayr ,  David Dominique Schweinfurth ,  Daniel Waldmann ,  Charles Hartger Winter ,  Kyle Blakeney ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC分类号： C07F5/06 ,  C23C16/455 ,  C23C16/08 ,  C23C16/20

摘要： Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 1, 2 or 3, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, wherein if n is 2 and E is NR or A is OR, at least one R in NR or OR bears no hydrogen atom in the 1-position.

公开(公告)号：US11655262B2

公开(公告)日：2023-05-23

申请号：US17710178

申请日：2022-03-31

申请人： BASF SE ,  Wayne State University

发明人： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC分类号： C07F5/06 ,  C23C16/08 ,  C23C16/20 ,  C23C16/455 ,  C23C16/12

CPC分类号： C07F5/069 ,  C07F5/067 ,  C23C16/08 ,  C23C16/12 ,  C23C16/20 ,  C23C16/45534 ,  C23C16/45553

摘要： A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state




where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,

E is NR or O,

n is 0, 1 or 2, m is 0, 1 or 2, and

R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US11505562B2

公开(公告)日：2022-11-22

申请号：US16954371

申请日：2018-11-09

申请人： BASF SE ,  Wayne State University

发明人： Lukas Mayr ,  David Dominique Schweinfurth ,  Daniel Waldmann ,  Charles Hartger Winter ,  Kyle Blakeney ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC分类号： C23C16/20 ,  C07F5/06 ,  C23C16/08 ,  C23C16/455 ,  C23C16/12

摘要： Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 1, 2 or 3, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, wherein if n is 2 and E is NR or A is OR, at least one R in NR or OR bears no hydrogen atom in the 1-position.

公开(公告)号：US20220220131A1

公开(公告)日：2022-07-14

申请号：US17710178

申请日：2022-03-31

申请人： BASF SE ,  Wayne State University

发明人： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC分类号： C07F5/06 ,  C23C16/08 ,  C23C16/20 ,  C23C16/455 ,  C23C16/12

摘要： A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.