MASK, DISPLAY SUBSTRATE AND DISPLAY DEVICE
    1.
    发明申请

    公开(公告)号:US20190219917A1

    公开(公告)日:2019-07-18

    申请号:US16106155

    申请日:2018-08-21

    IPC分类号: G03F1/44

    摘要: Disclosed are a mask, a display substrate and a display device. The mask comprises a substrate, a first exposure structure, a second exposure structure located at one side of the substrate and disposed opposite to each other, the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, an orthographic projection of the first light shielding film layer falls within an orthographic projection of the first light transmission film layer on the substrate; the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, an orthographic projection of the second light shielding film layer falls within an orthographic projection of the second light transmission film layer on the substrate; a side edge of the first exposure structure has a first zigzag structure, and a side edge of the second exposure structure has a second zigzag structure.

    PHASE SHIFT MASK AND ELECTRONIC COMPONENT MANUFACTURING METHOD

    公开(公告)号:US20210356856A1

    公开(公告)日:2021-11-18

    申请号:US16343756

    申请日:2018-10-26

    IPC分类号: G03F1/32 H01L21/027

    摘要: A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.