Picosecond-nanosecond laser composite asynchronous ceramics polishing method

    公开(公告)号:US11014197B2

    公开(公告)日:2021-05-25

    申请号:US16727726

    申请日:2019-12-26

    Abstract: The invention disclose a picosecond-nanosecond laser composite asynchronous ceramics polishing method. First, a picosecond laser is used to scan and irradiate the ceramic surface along the scanning path. At the same time, ceramic surface is initially flattened and the electronic state of materials is removed by picosecond laser to produce micro-nanoparticles. Micro-nanoparticles exist as ionized state in the adjacent space region of irradiated ceramics surface. Then, low energy density nanosecond laser is used according to a preset time to irradiate and melt these micro-nanoparticles which can easily form a dense and smooth fine crystal melting layer to achieve the polishing effect. The present disclosure fixes the generation of micro-cracks and pores in traditional laser polishing process. It overcomes the shortcomings of traditional laser polishing such as large thermal influence zone, easy to generate micro-cracks and pores on the surface, etc. High efficiency and high precision submicron level fine polishing with very low material removal amount is realized.

    PICOSECOND-NANOSECOND LASER COMPOSITE ASYNCHRONOUS CERAMICS POLISHING METHOD

    公开(公告)号:US20200269355A1

    公开(公告)日:2020-08-27

    申请号:US16727726

    申请日:2019-12-26

    Abstract: The invention disclose a picosecond-nanosecond laser composite asynchronous ceramics polishing method. First, a picosecond laser is used to scan and irradiate the ceramic surface along the scanning path. At the same time, ceramic surface is initially flattened and the electronic state of materials is removed by picosecond laser to produce micro-nanoparticles. Micro-nanoparticles exist as ionized state in the adjacent space region of irradiated ceramics surface. Then, low energy density nanosecond laser is used according to a preset time to irradiate and melt these micro-nanoparticles which can easily form a dense and smooth fine crystal melting layer to achieve the polishing effect. The present disclosure fixes the generation of micro-cracks and pores in traditional laser polishing process. It overcomes the shortcomings of traditional laser polishing such as large thermal influence zone, easy to generate micro-cracks and pores on the surface, etc. High efficiency and high precision submicron level fine polishing with very low material removal amount is realized.

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