Increased sensitivity photocathode structure
    1.
    发明授权
    Increased sensitivity photocathode structure 失效
    增加灵敏度光电子结构

    公开(公告)号:US3700947A

    公开(公告)日:1972-10-24

    申请号:US3700947D

    申请日:1971-04-08

    Applicant: BENDIX CORP

    CPC classification number: H01J40/06

    Abstract: A photocathode substrate includes a plurality of prisms to refract radiation before it impinges upon a photocathode material. The refraction causes most of the radiation to meet the photocathode material at an angle other than 90* so that internal reflection of the energy within the photocathode material occurs. This greatly enhances the probability of electrons being released from the photocathode material.

    Abstract translation: 光电阴极基板包括多个棱镜,以在其照射到光电阴极材料之前折射辐射。 折射导致大部分辐射以不同于90°的角度与光电阴极材料相遇,从而发生光电阴极材料内的能量的内部反射。 这大大提高了电子从光电阴极材料释放的可能性。

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