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公开(公告)号:US10689751B2
公开(公告)日:2020-06-23
申请号:US15855879
申请日:2017-12-27
Inventor: Changqi Hu , Shupeng Guo
Abstract: An evaporation source cover, an evaporation source and an evaporation apparatus are disclosed. The evaporation source cover comprises a cover body and an elastic dredging member which is arranged on the cover body. The elastic dredging member comprises a bottom part and a top part. The elastic dredging member is fixed to a surface of the cover body at the bottom part. The elastic dredging member is configured to extend and contract in a direction perpendicular to the surface of the cover body.
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公开(公告)号:US20180363129A1
公开(公告)日:2018-12-20
申请号:US15781957
申请日:2017-12-15
Applicant: BOE Technology Group Co., Ltd.
Inventor: Shupeng Guo , Changqi Hu
IPC: C23C14/54 , C23C16/455 , C23C16/52 , G01B7/06 , C23C14/24
Abstract: An evaporation apparatus is disclosed. The evaporation apparatus includes an operation platform; an evaporation source on the operation platform; an inner plate on at least one side of the evaporation source, the inner plate being fixedly connected to the evaporation source; and an outer plate on a side of the inner plate away from the evaporation source, the outer plate being adjacent to the inner plate. The inner plate can be configured to detect an evaporation rate of the evaporation source, and the outer plate can adjust an evaporation range.
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公开(公告)号:US10408596B2
公开(公告)日:2019-09-10
申请号:US15580213
申请日:2017-04-01
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Bin Bu , Changqi Hu , Shupeng Guo
Abstract: The present disclosure relates to an apparatus for detecting a distance between a carrier and a plate, the apparatus comprising: a base provided on the carrier; a rotation mechanism rotatably provided on the base and configured to rotate when the carrier is in contact with the plate during movement of the carrier relative to the plate; a rotation angle measuring mechanism configured to measure a rotation angle of the rotation mechanism so as to obtain the distance according to the rotation angle. The distance between the carrier and the plate can be calculated based on the rotation angle of the rotation mechanism, so that accurate measurement of the distance between the carrier and the plate can be realized. Further, the operation performance of the gap detection apparatus would not be affected or damaged by the vacuum environment.
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公开(公告)号:US10988839B2
公开(公告)日:2021-04-27
申请号:US16106136
申请日:2018-08-21
Inventor: Changqi Hu , Mengdi Wang
IPC: C23C14/24
Abstract: The disclosure discloses an evaporation source and an evaporation device. The evaporation source includes an evaporation case, a crucible, and a heating unit; the evaporation case includes a top plate, a bottom plate, a first side plate, a second side plate, a first end plate, and a second end plate; a connecting section is arranged on the side of the top plate facing the bottom plate, a nozzle group is arranged on the bottom plate to jet gas in the direction away from the top plate; and the crucible includes a cubicle body, and a folded side arranged on the outside of the crucible body, a plurality of gas outlet holes are arranged in the folded side, and the crucible body cooperates slidably with the connecting section through the folded side.
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公开(公告)号:US10354901B2
公开(公告)日:2019-07-16
申请号:US15540545
申请日:2016-09-14
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Qinghua Zou , Shupeng Guo , Changqi Hu
IPC: H01L21/677 , H01L21/67 , H01L21/687 , H01L21/673
Abstract: A conveying device, a conveying method, and an evaporation apparatus are provided. The conveying device comprises a carrying mechanism for carrying a substrate; and a fastening mechanism for fastening the substrate on the carrying mechanism in a mechanical manner. In the conveying device, the substrate is fastened on the carrying mechanism in a mechanical manner by the fastening mechanism. As compared with electrostatic fastening and adhesive fastening, this reduces damage to the substrate, increases the reliability for fastening the substrate, and makes it easy to receive and detach the substrate.
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公开(公告)号:US20170191155A1
公开(公告)日:2017-07-06
申请号:US15218507
申请日:2016-07-25
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Changqi Hu , Shupeng Guo , Qinghua Zou , Bin Bu
CPC classification number: C23C14/50 , C23C14/042 , C23C14/24 , C23C14/541
Abstract: A vapor deposition system including a vapor deposition mechanism and a separation mechanism is provided. The vapor deposition mechanism includes a vapor deposition source, and further includes a vapor deposition baseplate and a cover plate that are located at a side of the vapor deposition source in a vapor deposition direction in order; the cover plate comprises a frame defining an enclosed frame region, the frame comprises a contact surface with the vapor deposition baseplate, and the contact surface comprise an adhesion portion, and the vapor deposition baseplate is capable of being adhered to the cover plate; the separation mechanism comprises at least one support plate and at least one movable bar connected with the support plate, the movable bar is configured to separate the vapor deposition baseplate from the cover plate after completion of film vapor deposition.
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