Evaporation Apparatus
    2.
    发明申请

    公开(公告)号:US20180363129A1

    公开(公告)日:2018-12-20

    申请号:US15781957

    申请日:2017-12-15

    Abstract: An evaporation apparatus is disclosed. The evaporation apparatus includes an operation platform; an evaporation source on the operation platform; an inner plate on at least one side of the evaporation source, the inner plate being fixedly connected to the evaporation source; and an outer plate on a side of the inner plate away from the evaporation source, the outer plate being adjacent to the inner plate. The inner plate can be configured to detect an evaporation rate of the evaporation source, and the outer plate can adjust an evaporation range.

    Apparatus for detecting distance between carrier and plate

    公开(公告)号:US10408596B2

    公开(公告)日:2019-09-10

    申请号:US15580213

    申请日:2017-04-01

    Abstract: The present disclosure relates to an apparatus for detecting a distance between a carrier and a plate, the apparatus comprising: a base provided on the carrier; a rotation mechanism rotatably provided on the base and configured to rotate when the carrier is in contact with the plate during movement of the carrier relative to the plate; a rotation angle measuring mechanism configured to measure a rotation angle of the rotation mechanism so as to obtain the distance according to the rotation angle. The distance between the carrier and the plate can be calculated based on the rotation angle of the rotation mechanism, so that accurate measurement of the distance between the carrier and the plate can be realized. Further, the operation performance of the gap detection apparatus would not be affected or damaged by the vacuum environment.

    Evaporation source and evaporation device

    公开(公告)号:US10988839B2

    公开(公告)日:2021-04-27

    申请号:US16106136

    申请日:2018-08-21

    Abstract: The disclosure discloses an evaporation source and an evaporation device. The evaporation source includes an evaporation case, a crucible, and a heating unit; the evaporation case includes a top plate, a bottom plate, a first side plate, a second side plate, a first end plate, and a second end plate; a connecting section is arranged on the side of the top plate facing the bottom plate, a nozzle group is arranged on the bottom plate to jet gas in the direction away from the top plate; and the crucible includes a cubicle body, and a folded side arranged on the outside of the crucible body, a plurality of gas outlet holes are arranged in the folded side, and the crucible body cooperates slidably with the connecting section through the folded side.

    Conveying device, conveying method and evaporation apparatus

    公开(公告)号:US10354901B2

    公开(公告)日:2019-07-16

    申请号:US15540545

    申请日:2016-09-14

    Abstract: A conveying device, a conveying method, and an evaporation apparatus are provided. The conveying device comprises a carrying mechanism for carrying a substrate; and a fastening mechanism for fastening the substrate on the carrying mechanism in a mechanical manner. In the conveying device, the substrate is fastened on the carrying mechanism in a mechanical manner by the fastening mechanism. As compared with electrostatic fastening and adhesive fastening, this reduces damage to the substrate, increases the reliability for fastening the substrate, and makes it easy to receive and detach the substrate.

    VAPOR DISPOSITION SYSTEM
    6.
    发明申请

    公开(公告)号:US20170191155A1

    公开(公告)日:2017-07-06

    申请号:US15218507

    申请日:2016-07-25

    CPC classification number: C23C14/50 C23C14/042 C23C14/24 C23C14/541

    Abstract: A vapor deposition system including a vapor deposition mechanism and a separation mechanism is provided. The vapor deposition mechanism includes a vapor deposition source, and further includes a vapor deposition baseplate and a cover plate that are located at a side of the vapor deposition source in a vapor deposition direction in order; the cover plate comprises a frame defining an enclosed frame region, the frame comprises a contact surface with the vapor deposition baseplate, and the contact surface comprise an adhesion portion, and the vapor deposition baseplate is capable of being adhered to the cover plate; the separation mechanism comprises at least one support plate and at least one movable bar connected with the support plate, the movable bar is configured to separate the vapor deposition baseplate from the cover plate after completion of film vapor deposition.

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