公开(公告)号：US20190237488A1

公开(公告)日：2019-08-01

申请号：US16330922

申请日：2018-05-15

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Haixu LI ,  Zhanfeng CAO ,  Qi YAO ,  Dapeng XUE ,  Da LU

IPC: H01L27/12 ,  H01L29/66 ,  H01L29/786

CPC classification number: H01L27/1218 ,  H01L29/6675 ,  H01L29/78633 ,  H01L29/78672

Abstract: The present disclosure provides a field of display technologies, and in particular, to a LTPS substrate and a fabricating method thereof, a thin film transistor thereof, an array substrate thereof, and a display device thereof. The LTPS substrate, able to be used for the fabrication of a thin film transistor, includes a light shielding layer, the light shielding layer mainly composed of amorphous silicon doped with a lanthanide element. The present disclosure mainly employs an amorphous silicon film layer doped with the lanthanide element as the light shielding layer of the LTPS substrate, which not only ensures the light shielding efficiency but also reduces the production process, and further prevents the occurrence of the H explosion problem due to H exuding during the ELA process.

公开(公告)号：US20210333457A1

公开(公告)日：2021-10-28

申请号：US16485810

申请日：2019-01-24

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuilang DONG ,  Xin GU ,  Kang GUO ,  Da LU ,  Qingzhao LIU ,  Lei ZHAO

IPC: G02B5/30 ,  C23F1/12 ,  G03F7/16 ,  G03F7/42 ,  G03F7/00

Abstract: A method of manufacturing a metal wire, a method of manufacturing a metal wire grid, a wire grid polarizer, and an electronic device are provided. The method of manufacturing a metal wire includes: forming a metal material layer on a base substrate etching the metal material layer by using a composite gas including an etching gas and a coating reaction gas to form the metal wire and a protective coating layer on a surface of the metal wire.