公开(公告)号：US07754518B2

公开(公告)日：2010-07-13

申请号：US12032475

申请日：2008-02-15

申请人： Blake Koelmel ,  Robert C. McIntosh ,  David D L Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

发明人： Blake Koelmel ,  Robert C. McIntosh ,  David D L Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

IPC分类号： H01L21/00

CPC分类号： H01L21/67115 ,  H01L21/268 ,  H01L21/68735 ,  H01L21/68742

摘要： A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.

摘要翻译： 提供了一种用于热处理衬底的方法和装置。 衬底被布置在处理室内，其被配置用于通过将电磁能量引导到衬底的表面进行热处理。 提供能量阻挡器以阻挡朝向衬底的能量的至少一部分。 当入射能量接近衬底的边缘时，阻挡剂防止由于热应力而损坏衬底。

公开(公告)号：US07923280B2

公开(公告)日：2011-04-12

申请号：US12834620

申请日：2010-07-12

申请人： Blake Koelmel ,  Robert C. McIntosh ,  David D L Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

发明人： Blake Koelmel ,  Robert C. McIntosh ,  David D L Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

IPC分类号： H01L21/00

CPC分类号： H01L21/67115 ,  H01L21/268 ,  H01L21/68735 ,  H01L21/68742

摘要： A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.

摘要翻译： 提供了一种用于热处理衬底的方法和装置。 衬底被布置在处理室内，其被配置用于通过将电磁能量引导到衬底的表面进行热处理。 提供能量阻挡器以阻挡朝向衬底的能量的至少一部分。 当入射能量接近衬底的边缘时，阻挡剂防止由于热应力而损坏衬底。