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公开(公告)号:US07961293B2
公开(公告)日:2011-06-14
申请号:US12076307
申请日:2008-03-17
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hebertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hebertus Mulkens , Jan Bernard Plechelmus Van Schoot
CPC分类号: G03F7/70341 , G03F7/70333
摘要: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译: 在浸没光刻设备或器件制造方法中,在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中,焦点可以使用浸没式光刻设备的液体供应系统来改变。