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1.Process for producing CMOS structures with Schottky bipolar transistors 失效
标题翻译: 用肖特基双极晶体管制造CMOS结构的工艺公开(公告)号:US4536945A
公开(公告)日:1985-08-27
申请号:US601195
申请日:1984-04-17
IPC分类号: H01L21/285 , H01L21/331 , H01L21/76 , H01L21/762 , H01L21/8222 , H01L21/8249 , H01L27/06 , H01L27/082 , H01L29/47 , H01L29/73 , H01L29/732 , H01L29/872 , H01L21/22
CPC分类号: H01L21/8249 , H01L21/28518 , H01L21/28537 , H01L21/76216
摘要: A process is disclosed for making CMOS transistors in combination with self-aligned fully oxide isolated Schottky clamped bipolar transistors.
摘要翻译: 公开了一种制造CMOS晶体管与自对准全氧化物隔离肖特基钳位双极晶体管的方法。