公开(公告)号：US20110161014A1

公开(公告)日：2011-06-30

申请号：US12977710

申请日：2010-12-23

申请人： Byeong-Cheol KIM ,  Ho-Hyung Jung ,  Dong-keun Shin

发明人： Byeong-Cheol KIM ,  Ho-Hyung Jung ,  Dong-keun Shin

IPC分类号： G01N21/88 ,  G06F19/00

CPC分类号： G01N21/9501 ,  G01N21/9503

摘要： A device to inspect a non-pattern wafer includes a light source to emit light that reflected from a wafer. A judgment unit converts the detected light into a quantitative measured value to determine whether the wafer is faulty. The wafer comprises a first region and a second region. The detection unit sequentially detects lights reflected from the first and second regions of the wafer, and a judgment unit converts the lights reflected from the first and second regions of the wafer into first and second quantitative measured values, respectively. The second region of the wafer is determined to be faulty by comparing the second measured value with a first reference value, wherein the first reference value is calculated using an average value between the first and second measured values, and a characteristic value that indicates distribution of the first and second measured values.

摘要翻译： 用于检查非图案晶片的装置包括发射从晶片反射的光的光源。 判断单元将检测到的光转换成定量测量值以确定晶片是否有故障。 晶片包括第一区域和第二区域。 检测单元顺序地检测从晶片的第一和第二区域反射的光，并且判断单元将从晶片的第一和第二区域反射的光分别转换为第一和第二定量测量值。 通过将第二测量值与第一参考值进行比较来确定晶片的第二区域是错误的，其中使用第一和第二测量值之间的平均值来计算第一参考值，以及表示第一参考值的特征值， 第一和第二测量值。