公开(公告)号：US20170115599A1

公开(公告)日：2017-04-27

申请号：US15293578

申请日：2016-10-14

Applicant: CANON FINETECH INC.

Inventor： Ryosuke Kosone ,  Ryo Nakajima ,  Naoki Tamaru

IPC: G03G15/08

CPC classification number: G03G15/0867 ,  G03G15/0879 ,  G03G15/0898 ,  G03G21/18

Abstract: A developing apparatus includes: a supply path configured to supply a developer; a discharge path configured to discharge the developer supplied from the supply path and perform developing; a developer holding portion configured to exert a predetermined force for holding the developer at the discharge path; and a developer accommodation portion accommodating the developer which is supplied from the supply path, and having a space volume so that the developer does not spout out from the discharge path on which the predetermined force is exerted by the developer holding portion according to an increase in an internal pressure of the developer accommodation portion when the developer is supplied from the supply path in a state where a predetermined amount of the developer is accommodated.