METHOD OF FORMING PLANAR SACRIFICIAL MATERIAL IN A MEMS DEVICE
    1.
    发明申请
    METHOD OF FORMING PLANAR SACRIFICIAL MATERIAL IN A MEMS DEVICE 有权
    在MEMS器件中形成平面非晶材料的方法

    公开(公告)号:US20160207763A1

    公开(公告)日:2016-07-21

    申请号:US14914504

    申请日:2014-09-02

    CPC classification number: B81C1/00611 H01G5/16

    Abstract: The present invention generally relates to a method of fabricating a MEMS device. In the MEMS device, a movable plate is disposed within a cavity such that the movable plate is movable within the cavity. To form the cavity, sacrificial material may be deposited and then the material of the movable plate is deposited thereover. The sacrificial material is removed to free the mov able plate to move within the cavity. The sacrificial material, once deposited, may not be sufficiently planar because the height difference between the lowest point and the highest point of the sacrificial material may be quite high. To ensure the movable plate is sufficiently planar, the planarity of the sacrificial material should be maximized. To maximize the surface planarity of the sacrificial material, the sacrificial material may be deposited and then conductive heated to permit the sacrificial material to reflow and thus, be planarized.

    Abstract translation: 本发明一般涉及制造MEMS器件的方法。 在MEMS装置中,可动板设置在空腔内,使得可移动板可在空腔内移动。 为了形成空腔,可以沉积牺牲材料,然后将可移动板的材料沉积在其上。 去除牺牲材料以使可移动板在空腔内移动。 由于牺牲材料的最低点和最高点之间的高度差可能相当高,牺牲材料一旦被沉积就可能不够平坦。 为了确保可动板足够平坦,牺牲材料的平面度应该被最大化。 为了使牺牲材料的表面平坦度最大化,可以沉积牺牲材料,然后进行导电加热,以使牺牲材料回流并因此被平坦化。

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