专利检索 ap:("CEKO CO., LTD." OR "DANKOOK UNIVERSITY CHEONAN CAMPUS INDUSTRY ACADEMIC" OR "POSTECH ACADEMY-INDUSTRY FOUNDATION") AND inv:"Dong Hoon Jang" 第 1 页

1.

发明授权
Self-healing functional polyvinvyl-based compound and preparation method thereof 有权

公开(公告)号：US11136470B2

公开(公告)日：2021-10-05

申请号：US16605065

申请日：2018-04-12

申请人： CEKO CO., LTD. , DANKOOK UNIVERSITY CHEONAN CAMPUS INDUSTRY ACADEMIC , POSTECH ACADEMY-INDUSTRY FOUNDATION

发明人： Moon Hor Ree , Kyung Ho Kwon , Won Yeong Ryu , Kwan Young Han , Sung Kyoo Lim , Byung Min Park , Dong Hoon Jang , Hyun Joong Kim , Hong Chul Kim , Jeong Rae Kim

IPC分类号： C08F220/20 , C08F220/30 , C08F220/34 , C09D133/14 , C08J7/046 , C08F220/28 , C08F220/56 , C09D133/06 , C09D133/08 , C08K5/17 , C08K5/18 , C08K5/3445 , C08K5/3462

摘要： The present invention relates to a polyvinyl-based compound, which maximizes self-healing ability by introducing various functional molecules into a brush of a polyvinyl-based resin, a preparation method thereof, and a polymer coating film produced therefrom.