-
公开(公告)号:US10065912B2
公开(公告)日:2018-09-04
申请号:US15473940
申请日:2017-03-30
Applicant: CENTRAL GLASS COMPANY, LIMITED
Inventor: Takaaki Yoshimura , Toshihiko Oono , Shinya Akiba , Masaki Fujiwara
CPC classification number: C07C41/42 , C07C41/22 , C07C41/44 , C07C43/123
Abstract: An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).