公开(公告)号：US20240344633A1

公开(公告)日：2024-10-17

申请号：US18683450

申请日：2022-12-14

Applicant: CKD CORPORATION

Inventor： Toshikazu OGISU

IPC: F16K51/02 ,  F16K49/00

CPC classification number: F16K51/02 ,  F16K49/00

Abstract: A pressure control valve for opening/closing a circular outlet port that connects a vacuum chamber used in a semiconductor manufacturing apparatus and an exhaust pump for evacuating the vacuum chamber, the pressure control valve including a valve unit that contacts and separates from a valve seat provided radially outward from the outlet port, wherein the valve unit includes: a hollow portion located between an upper surface of the valve unit on the vacuum chamber side and a lower surface of the valve unit on the exhaust pump side; a first rubber heater covering a first rear surface of the upper surface in the hollow portion; and a second rubber heater covering a second rear surface of the lower surface in the hollow portion.

公开(公告)号：US20230259146A1

公开(公告)日：2023-08-17

申请号：US17799980

申请日：2021-03-02

Applicant: CKD CORPORATION

Inventor： Toshikazu OGISU

IPC: G05D7/06 ,  G01F3/38 ,  G01F15/00

CPC classification number: G05D7/0647 ,  G01F3/38 ,  G01F15/005

Abstract: A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.