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公开(公告)号：US20180052263A1
公开(公告)日：2018-02-22
申请号：US15554831
申请日：2016-03-02
Applicant: CORNING INCORPORATED
Inventor： Hsichieh Chen , Jr-Nan Hu , Yawei Sun , Shoou-yu Tang , Bor Kai Wang
CPC classification number: G02B5/23 , G02B5/003 , G02B2207/123
Abstract: A louver structure is formed in a layer on a transparent substrate or embedded in the photosensitive substrate to form a privacy filter. The louver structure is made of an alternating arrangement of non-transparent strip elements and transparent strip elements or spaces. The louver structure is created by mask and actinic radiation, which can enable mass production and a short lead-time.
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