-
公开(公告)号：US20230174420A1
公开(公告)日：2023-06-08
申请号：US18103789
申请日：2023-01-31
Applicant: CORNING INCORPORATED
Inventor： Seo-Yeong Cho , Kyung-jin Lee , Yoon-seuk Oh , Jun-Ro Yoon
CPC classification number: C03C17/3634 , C03C15/00 , C03C2217/26 , C03C2217/282 , C03C21/002
Abstract: A method of fabricating a metal thin film-on-glass structure. A glass substrate, on a top surface of which a layer is formed, is prepared. A local area of the glass substrate is etched from a bottom of the glass substrate to expose the layer downwardly, thereby forming an exposed area of the layer. The layer is a metal thin film. The etching includes first-etching the glass substrate to a depth less than a thickness of the glass substrate using a first etching solution containing hydrofluoric acid and at least one of nitric acid and sulfuric acid, resulting in a first-etched portion of the glass substrate; and second-etching the first-etched portion of the glass substrate using an etching solution containing hydrofluoric acid without nitric acid or sulfuric acid, so that the layer is exposed downwardly, whereby the metal thin film is supported by a remaining portion of the glass substrate.
-
公开(公告)号：US11584683B2
公开(公告)日：2023-02-21
申请号：US16491363
申请日：2018-03-09
Applicant: CORNING INCORPORATED
Inventor： Seo-Yeong Cho , Kyung-jin Lee , Yoon-seuk Oh , Jun Ro Yoon
Abstract: A method of fabricating a metal thin film-on-glass structure. A glass substrate, on a top surface of which a layer is formed, is prepared. A local area of the glass substrate is etched from a bottom of the glass substrate to expose the layer downwardly, thereby forming an exposed area of the layer. The layer is a metal thin film. The etching includes first-etching the glass substrate to a depth less than a thickness of the glass substrate using a first etching solution containing hydrofluoric acid and at least one of nitric acid and sulfuric acid, resulting in a first-etched portion of the glass substrate; and second-etching the first-etched portion of the glass substrate using an etching solution containing hydrofluoric acid without nitric acid or sulfuric acid, so that the layer is exposed downwardly, whereby the metal thin film is supported by a remaining portion of the glass substrate.
-
3.发明申请公开(公告)号：US20200263484A1
公开(公告)日：2020-08-20
申请号：US16348029
申请日：2017-11-02
Applicant: Corning Incorporated
Inventor： Seo-Yeong Cho , Ki-yeon Lee , Kyung-jin Lee , Yoon-seuk Oh , Choon-bong Yang
Abstract: A vacuum insulated glass unit (IGU) including an interconnected polymer spacer matrix and methods of making the same. The vacuum IGU includes a first glass-based layer, a second glass-based layer, an interconnected polymer spacer matrix, and an edge seal between the periphery of the first and second glass-based layers.
-
-
Search Results
3
records
(took 0.01 seconds)
