公开(公告)号：US20230377847A1

公开(公告)日：2023-11-23

申请号：US17664224

申请日：2022-05-20

Applicant: CREATING NANO TECHNOLOGIES, INC.

Inventor： Yi-Ming HSU ,  Liang-Chun WANG ,  Yung-Hao CHEN ,  Po-Hsuan CHEN ,  Wen-Chieh TAN ,  Huang-Wei CHEN

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32825 ,  H01J37/32513 ,  H01J37/3255 ,  H01J2237/335 ,  H01J2237/334

Abstract: A spot type atmospheric pressure plasma device includes a metal casing, a metal electrode, a dielectric layer, and a gas channel. The metal electrode is disposed in an inner space of the metal casing. The dielectric layer is disposed in the inner space and surrounds an outer side surface of the metal electrode. A central area of a bottom of the dielectric layer has a plasma jet, and a bottom of the metal electrode is adjacent to the plasma jet. The gas channel includes a first section, a second section, and a third section. The first section passes through the metal casing and the dielectric layer. The second section is connected to the first section and extends between the dielectric layer and the outer side surface. The third section is connected to the second section, and is configured to direct a working gas to the plasma jet.

公开(公告)号：US20230377846A1

公开(公告)日：2023-11-23

申请号：US17664048

申请日：2022-05-19

Applicant: CREATING NANO TECHNOLOGIES, INC.

Inventor： Yi-Ming HSU ,  Liang-Chun WANG ,  Yung-Hao CHEN ,  Po-Hsuan CHEN ,  Shih-Chang WANG ,  Huang-Wei CHEN

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32825 ,  H01J37/32513 ,  H01J2237/332 ,  H01J2237/335 ,  H01J37/32577 ,  H01J37/3255

Abstract: A wide area atmospheric pressure plasma device includes a metal casing, a metal electrode, and a dielectric layer. The metal casing includes a chamber, at least one gas channel, and a plasma jet channel, in which the plasma jet channel is located under the chamber. The metal electrode is disposed within the chamber, is adjacent to the plasma jet channel, and extends along a length direction of the plasma jet channel. An outlet of the gas channel is adjacent to a bottom of the metal electrode, such that a working gas in the gas channel is sprayed towards the bottom of the metal electrode. The dielectric layer wraps the metal electrode.