公开(公告)号：US20210263423A1

公开(公告)日：2021-08-26

申请号：US17317417

申请日：2021-05-11

Applicant: Carl Zeiss SMT GmbH

Inventor： Christof Jalics ,  Fabian Schuster ,  Holger Kierey ,  Andreas Sandner ,  Tobias Meisch

IPC: G03F7/20 ,  G02B5/18 ,  G02B5/08

Abstract: A mirror for an illumination optical unit of a projection exposure apparatus comprises a spectral filter in the form of a grating structure, wherein the grating structure has a maximum edge steepness in the range of 15° to 60°.

公开(公告)号：US12111578B2

公开(公告)日：2024-10-08

申请号：US17317417

申请日：2021-05-11

Applicant: Carl Zeiss SMT GmbH

Inventor： Christof Jalics ,  Fabian Schuster ,  Holger Kierey ,  Andreas Sandner ,  Tobias Meisch

IPC: G03F7/00 ,  G02B5/08 ,  G02B5/18

CPC classification number: G03F7/70166 ,  G02B5/0891 ,  G02B5/1861 ,  G03F7/70191 ,  G03F7/702

Abstract: A mirror for an illumination optical unit of a projection exposure apparatus comprises a spectral filter in the form of a grating structure, wherein the grating structure has a maximum edge steepness in the range of 15° to 60°.