-
公开(公告)号:US07759136B2
公开(公告)日:2010-07-20
申请号:US11530164
申请日:2006-09-08
申请人: Chang-Cheng Hung , Hung Chang Hsieh , Shih-Ming Chang , Wen-Chuan Wang , Chi-Lun Lu , Allen Hsia , Yen-Bin Huang
发明人: Chang-Cheng Hung , Hung Chang Hsieh , Shih-Ming Chang , Wen-Chuan Wang , Chi-Lun Lu , Allen Hsia , Yen-Bin Huang
摘要: A method for patterning a substrate includes forming a material layer on the substrate; performing a first etching on the material layer to form a pattern; measuring the pattern of the material layer using an optical spectrum metrology tool; determining whether the measuring indicates that the etching step achieved a predefined result; and producing an etching recipe and performing a second etching of the material layer using the etching recipe if the predefined result was not achieved.
摘要翻译: 用于图案化衬底的方法包括在衬底上形成材料层; 在所述材料层上进行第一蚀刻以形成图案; 使用光谱计量工具测量材料层的图案; 确定测量是否指示蚀刻步骤达到预定结果; 并且如果未实现预定结果,则使用蚀刻配方产生蚀刻配方并执行材料层的第二蚀刻。