AIR FILTERING DEVICE AND CLEANING SYSTEM OF SEMICONDUCTOR MANUFACTURING APPARATUS WITH THE SAME
    1.
    发明申请
    AIR FILTERING DEVICE AND CLEANING SYSTEM OF SEMICONDUCTOR MANUFACTURING APPARATUS WITH THE SAME 失效
    半导体制造装置的空气过滤装置和清洁系统

    公开(公告)号:US20090025565A1

    公开(公告)日:2009-01-29

    申请号:US12180289

    申请日:2008-07-25

    IPC分类号: B01D49/00

    摘要: An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

    摘要翻译: 一种半导体制造装置的空气过滤装置和空气净化系统,以降低成本并提高制造生产率。 空气过滤装置可以包括具有联接到空气供应管线的开口孔的框架。 被构造成插入到框架中的缓冲框架可以包括多个狭槽部分,每个狭槽部分具有多个空气进/出孔,空气可以通过空气进入或离开缓冲器框架。 多个过滤器可以可释放地紧固到多个槽部分,以过滤包含在流过空气进/出孔的空气中的污染物质。 当更换多个过滤器时,可以使用用于中断通过空气入口/出口的空气的空气断路器,从而在更换期间向半导体制造装置提供净化的空气。

    HEAT TREATMENT EQUIPMENT
    2.
    发明申请
    HEAT TREATMENT EQUIPMENT 有权
    热处理设备

    公开(公告)号:US20080011735A1

    公开(公告)日:2008-01-17

    申请号:US11775640

    申请日:2007-07-10

    IPC分类号: F27D11/00

    摘要: In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

    摘要翻译: 在一个实施例中,热处理设备包括处理管,连接到处理管的排气管道,以及在操作期间排出存在于处理管内的气体。 热处理设备还包括插入处理管和排气管之间的中空压力控制构件,压力控制构件分别可操作地连接到处理管和排气管,并且包括一个或多个开口。 在热处理过程中,在处理管中避免负压,使得不需要的气体和杂质不能从外部进入工艺管。