APPARATUS AND METHOD FOR WET PROCESSING SUBSTRATE
    1.
    发明申请
    APPARATUS AND METHOD FOR WET PROCESSING SUBSTRATE 有权
    湿处理基板的装置和方法

    公开(公告)号:US20120067848A1

    公开(公告)日:2012-03-22

    申请号:US13161502

    申请日:2011-06-16

    Applicant: Chao-Wen LIN

    Inventor: Chao-Wen LIN

    Abstract: An exemplary wet processing apparatus includes a tank, a conveyor configured for conveying a substrate, and a spraying system. The tank receives a wet processing liquid. The conveyor includes a first conveying portion, a second conveying portion, and a third conveying portion. The first conveying portion is in the tank and conveys the substrate in the wet processing liquid. The second conveying portion is obliquely interconnected between the first and third conveying portions. The third conveying portion conveys the substrate above the wet processing liquid in the tank. The spraying system is above the third conveying portion, sprays the wet processing liquid onto the substrate on the third conveying portion.

    Abstract translation: 示例性的湿式处理装置包括罐,输送基板的输送机和喷涂系统。 罐接收湿处理液。 输送机包括第一输送部分,第二输送部分和第三输送部分。 第一输送部分在罐中并在湿处理液体中输送基底。 第二输送部分在第一和第三输送部分之间倾斜地互连。 第三输送部分将基板传送到罐中的湿处理液体上。 喷涂系统在第三输送部分之上,将湿处理液体喷射到第三输送部分上的基板上。

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