公开(公告)号：US11174378B2

公开(公告)日：2021-11-16

申请号：US17237119

申请日：2021-04-22

Applicant: Chevron Phillips Chemical Company LP

Inventor： Chung Ching Tso ,  Errun Ding ,  Randall S. Muninger ,  John T. Blagg ,  Yongwoo Inn ,  Max P. McDaniel ,  Ashish M. Sukhadia ,  Sarah Eppinger

IPC: C08F210/16 ,  C08L23/06 ,  C08F4/6592 ,  C08L23/16

Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.

公开(公告)号：US20210253835A1

公开(公告)日：2021-08-19

申请号：US17237119

申请日：2021-04-22

Applicant: Chevron Phillips Chemical Company LP

Inventor： Chung Ching Tso ,  Errun Ding ,  Randall S. Muninger ,  John T. Blagg ,  Yongwoo Inn ,  Max P. McDaniel ,  Ashish M. Sukhadia ,  Sarah Eppinger

IPC: C08L23/06 ,  C08F4/6592 ,  C08F210/16 ,  C08L23/16

Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.

公开(公告)号：US20210054178A1

公开(公告)日：2021-02-25

申请号：US16543686

申请日：2019-08-19

Applicant: Chevron Phillips Chemical Company LP

Inventor： Chung Ching Tso ,  Errun Ding ,  Randall S. Muninger ,  John T. Blagg ,  Yongwoo Inn ,  Max P. McDaniel ,  Ashish M. Sukhadia ,  Sarah Eppinger

IPC: C08L23/06 ,  C08F210/16 ,  C08F4/6592

Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.

公开(公告)号：US11028258B2

公开(公告)日：2021-06-08

申请号：US16543686

申请日：2019-08-19

Applicant: Chevron Phillips Chemical Company LP

Inventor： Chung Ching Tso ,  Errun Ding ,  Randall S. Muninger ,  John T. Blagg ,  Yongwoo Inn ,  Max P. McDaniel ,  Ashish M. Sukhadia ,  Sarah Eppinger

IPC: C08L23/16 ,  C08F210/16 ,  C08L23/06 ,  C08F4/6592

Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.