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公开(公告)号:US4321105A
公开(公告)日:1982-03-23
申请号:US115402
申请日:1980-01-25
Applicant: Christ H. Melonio , Gilbert P. Layfield
Inventor: Christ H. Melonio , Gilbert P. Layfield
CPC classification number: B29C33/424 , B41C1/06 , B41C3/00 , B44C1/227 , C23F1/04
Abstract: A method for producing embossed designs on work surfaces such as on molds, rolls or dies. A photomechanically imageable transfer material is exposed to the design to be embossed. The material is developed and the acid resistant design material remaining on a backing sheet is mechanically transferred to the work surface by burnishing the back of the backing sheet. The surface is then etched and the acid resistant design elements removed so that the embossed work surface is ready for use.
Abstract translation: 用于在诸如模具,辊或模具的工作表面上制造压花设计的方法。 将光学可成像的转印材料暴露于要压花的设计。 材料被开发,残留在背衬片上的耐酸设计材料通过抛光背衬片的背面被机械地转移到工作表面。 然后蚀刻表面,除去耐酸设计元件,使得压花工作表面准备使用。