公开(公告)号：US4424102A

公开(公告)日：1984-01-03

申请号：US479405

申请日：1983-03-28

申请人： Christine Brandeis ,  Jurgen Kempf ,  Georg Kraus ,  Ulrich Ku/ nzel

发明人： Christine Brandeis ,  Jurgen Kempf ,  Georg Kraus ,  Ulrich Ku/ nzel

IPC分类号： C23F4/00 ,  H01J37/32 ,  H01J37/34 ,  H01L21/00 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/673 ,  C23C15/00

CPC分类号： H01L21/67069 ,  C23F4/00 ,  H01J37/32623 ,  H01J37/3266 ,  H01J37/3405

摘要： A reactor comprising a plate-shaped cathode that is horizontally arranged and connected to an alternating voltage, in a ground connected casing, and gas inlet and gas outlet lines. The cathode is equipped with means for generating local magnetic fields restricted to the region of the individually supported substrates. The cathode can be furthermore have holes or openings in which are arranged substrate holders shiftable or movable vertically to relate to the substrate surface. The substrates are etched in the reactor by means of a plasma which is produced from at least one reactive gas. Each substrate is exposed to at least one local magnetic field. If a mostly chemically etchable material is to be etched in the presence of a mostly physically etchable material, to a much stronger extent than the latter, the advantageous etching speed ratio can be set in that the substrates are additionally raised over the cathode surface.

摘要翻译： 一种反应器，包括水平布置并连接到交流电压的板状阴极，在接地壳体中，以及气体入口和气体出口管线。 阴极配备有用于产生限于单独支撑的衬底的区域的局部磁场的装置。 阴极还可以具有孔或开口，其中布置有衬底保持器，其可移动或垂直移动以涉及衬底表面。 通过由至少一种反应性气体产生的等离子体在反应器中蚀刻基板。 每个衬底暴露于至少一个局部磁场。 如果在大多数物理上可蚀刻的材料的存在下大部分化学蚀刻的材料被蚀刻到比后者更强的程度，则可以设置有利的蚀刻速度比，即衬底在阴极表面上另外升高。