Lathing and cleaning process for photoreceptor substrates
    4.
    发明授权
    Lathing and cleaning process for photoreceptor substrates 失效
    感光体基材的车床和清洁工艺

    公开(公告)号:US5346556A

    公开(公告)日:1994-09-13

    申请号:US143721

    申请日:1993-11-01

    CPC分类号: G03G5/102 G03G5/10

    摘要: A method of cleaning a substrate includes:(1) lathing a substrate surface with a cutting fluid composition containing (A) an antioxidant, (B) a surfactant, (C) a lubricant, and (D) water;(2) rinsing the lathed substrate surface with high quality deionized water having a resistivity of at least 2M ohm-cm;(3) immersing the rinsed lathed substrate surface in a bath of high quality deionized water having a resistivity of at least 2M ohm-cm; and(4) removing the substrate from the bath of deionized water at a rate low enough to prevent water droplets from forming on the substrate.

    摘要翻译: 清洗基材的方法包括:(1)用含有(A)抗氧化剂,(B)表面活性剂,(C)润滑剂和(D)水的切削液组合物对基材表面进行加工; (2)用电阻率至少为2M ohm-cm的高质量去离子水冲洗车床基体表面; (3)将经冲洗的车床基板表面浸入电阻率至少为2M ohm-cm的高质量去离子水浴中; 和(4)以足够低的速度从去离子水浴中除去基底以防止水滴在基底上形成。