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公开(公告)号：US5346556A
公开(公告)日：1994-09-13
申请号：US143721
申请日：1993-11-01
摘要： A method of cleaning a substrate includes:(1) lathing a substrate surface with a cutting fluid composition containing (A) an antioxidant, (B) a surfactant, (C) a lubricant, and (D) water;(2) rinsing the lathed substrate surface with high quality deionized water having a resistivity of at least 2M ohm-cm;(3) immersing the rinsed lathed substrate surface in a bath of high quality deionized water having a resistivity of at least 2M ohm-cm; and(4) removing the substrate from the bath of deionized water at a rate low enough to prevent water droplets from forming on the substrate.
摘要翻译： 清洗基材的方法包括：（1）用含有（A）抗氧化剂，（B）表面活性剂，（C）润滑剂和（D）水的切削液组合物对基材表面进行加工; （2）用电阻率至少为2M ohm-cm的高质量去离子水冲洗车床基体表面; （3）将经冲洗的车床基板表面浸入电阻率至少为2M ohm-cm的高质量去离子水浴中; 和（4）以足够低的速度从去离子水浴中除去基底以防止水滴在基底上形成。
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公开(公告)号：US5534172A
公开(公告)日：1996-07-09
申请号：US404382
申请日：1995-03-14
IPC分类号： C10M173/00 , C10M173/02 , C10N40/22
CPC分类号： C10M173/02 , C10M2201/02 , C10M2207/022 , C10M2207/023 , C10M2207/287 , C10M2207/288 , C10M2207/289 , C10M2209/104 , C10M2209/107 , C10M2215/04 , C10M2215/042 , C10M2229/02 , C10M2229/04 , C10M2229/041 , C10M2229/042 , C10M2229/043 , C10M2229/044 , C10M2229/045 , C10M2229/046 , C10M2229/047 , C10M2229/048 , C10M2229/05 , C10M2229/051 , C10M2229/052 , C10M2229/053 , C10M2229/054 , C10N2240/401 , C10N2250/02
摘要： An aqueous-based cutting fluid for machining photoreceptor substrates contains:(A) at least one antioxidant;(B) one or more surfactants, at least one of which is a polysiloxane surfactant;(C) at least one lubricant; and(D) water.The cutting fluid can also optionally contain one or more biocides. The cutting fluid is environmentally safe, non-toxic and biodegradable and can be removed in a postmachining cleaning process using only high quality distilled water.
摘要翻译： 用于加工感光体基材的水性切削液含有：（A）至少一种抗氧化剂; （B）一种或多种表面活性剂，其中至少一种是聚硅氧烷表面活性剂; （C）至少一种润滑剂; 和（D）水。 切削液还可任选地含有一种或多种杀生物剂。 切削液是环境安全的，无毒的和可生物降解的，并且可以在仅使用高品质蒸馏水的加工后清洁过程中除去。
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公开(公告)号：US5429715A
公开(公告)日：1995-07-04
申请号：US143709
申请日：1993-11-01
CPC分类号： G03G5/005
摘要： A method of rendering nonreflective an imaging member substrate, preferably a photoreceptor substrate, involves etching the substrate with(a) an effective amount of an etching agent at a temperature sufficient to effect etching of the substrate, wherein the etching agent comprises (i) high purity deionized water, (ii) a mixture of high purity deionized water and a mild acid or (iii) a mixture of high purity deionized water and a base; or(b) a combination of the etching agent (a) and modulating ultrasonic energy.This method renders the substrate clean, spotless, and pristine, and provides it with uniform surface roughness.
摘要翻译： 一种渲染非反射性的成像构件衬底（优选感光体衬底）的方法包括用（a）有效量的蚀刻剂在足以实现衬底蚀刻的温度下蚀刻衬底，其中蚀刻剂包括（i）高 纯度去离子水，（ii）高纯度去离子水和温和酸的混合物，或（iii）高纯度去离子水和碱的混合物; 或（b）蚀刻剂（a）和调制超声波能量的组合。 该方法使基材清洁，无污染，原始，并提供均匀的表面粗糙度。
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公开(公告)号：US5300784A
公开(公告)日：1994-04-05
申请号：US891109
申请日：1992-06-01
IPC分类号： G01N23/04 , G03B42/02 , G03G5/043 , G03G5/08 , G03G5/082 , G03G15/054 , H04N3/08 , H04N5/30 , H04N5/32 , G03G15/00 , G03G5/00
CPC分类号： H04N5/30 , G03G15/054 , G03G5/0433 , G03G5/08207 , H04N5/32
摘要： A selenium alloy electrophotographic imaging member having an optically transparent NESA coated substrate. An x-ray image is formed from the side of the photoreceptor opposite the transparent substrate and then is scanned from the back side through the transparent substrate with a fine beam of light, the position of which is precisely monitored. The ensuing discharge from the light beam is detected by a non-contacting x-ray transparent electrode located on the outer side of the photoreceptor, away from the substrate, which reads the discharge signal through capacitive coupling, pixel by pixel, according to the position of the light beam, to form a high resolution raster pattern digital readout of the image.
摘要翻译： 一种硒合金电子照相成像构件，其具有光学透明的NESA涂覆的基底。 从感光体的与透明基板相对的侧面形成x射线图像，然后从背面通过透明基板以精细的光束扫描其精确的位置。 通过位于感光体外侧的非接触式x射线透明电极，远离基板，通过电容耦合读取放电信号，通过电容耦合逐个像素地检测来自光束的放电，根据位置 的光束，以形成图像的高分辨率光栅图案数字读出。
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