Integration of photon emission microscope and focused ion beam
    1.
    发明授权
    Integration of photon emission microscope and focused ion beam 失效
    光子发射显微镜和聚焦离子束的集成

    公开(公告)号:US07245133B2

    公开(公告)日:2007-07-17

    申请号:US10985808

    申请日:2004-11-09

    IPC分类号: G01R31/302 G01L21/30

    CPC分类号: G01R31/302

    摘要: An integrated FIB/PEM apparatus and method for performing failure analysis on integrated circuits. In-situ failure analysis is enabled by integrating Photon Emission Microscopy into a Focused Ion Beam system, thereby improving throughput and efficiency of Failure Analysis. An iterative method is described for identifying and localizing fault sites on the circuit.

    摘要翻译: 用于对集成电路执行故障分析的集成FIB / PEM装置和方法。 通过将光子发射显微镜集成到聚焦离子束系统中来实现原位故障分析,从而提高故障分析的吞吐量和效率。 描述了用于识别和定位电路上的故障位置的迭代方法。

    Integration of photon emission microscope and focused ion beam
    2.
    发明申请
    Integration of photon emission microscope and focused ion beam 失效
    光子发射显微镜和聚焦离子束的集成

    公开(公告)号:US20060012385A1

    公开(公告)日:2006-01-19

    申请号:US10985808

    申请日:2004-11-09

    IPC分类号: G01R31/302

    CPC分类号: G01R31/302

    摘要: An integrated FIB/PEM apparatus and method for performing failure analysis on integrated circuits. In-situ failure analysis is enabled by integrating Photon Emission Microscopy into a Focused Ion Beam system, thereby improving throughput and efficiency of Failure Analysis. An iterative method is described for identifying and localizing fault sites on the circuit.

    摘要翻译: 用于对集成电路执行故障分析的集成FIB / PEM装置和方法。 通过将光子发射显微镜集成到聚焦离子束系统中来实现原位故障分析,从而提高故障分析的吞吐量和效率。 描述了用于识别和定位电路上的故障位置的迭代方法。