公开(公告)号：US20220305604A1

公开(公告)日：2022-09-29

申请号：US17289718

申请日：2020-04-17

Applicant: DALIAN UNIVERSITY OF TECHNOLOGY

Inventor： Ping ZHOU ,  Zhichao GENG ,  Ying YAN ,  Lin WANG ,  Kai WANG ,  Dongming GUO

IPC: B24B1/00 ,  B24B29/02 ,  B24B41/04 ,  B24B49/12 ,  B24B55/06

Abstract: Disclosed is a rocker type polishing apparatus and method for full-aperture deterministic polishing of a planar part. The apparatus includes a control system, a substrate, a lifting plate, a polishing module and a measuring module. The polishing module and the measuring module are arranged on the substrate. The lifting plate is arranged between the polishing module and the measuring module. The polishing module includes a rocker mechanism, a polishing pad surface dressing mechanism, a polishing pad surface profile measuring apparatus and a continuous polishing pad mechanism. Considering the specific surface profile of the planar part, the present invention makes the material removal rate distribution of the planar part and the surface profile of the planar part be in the normalized mirror symmetry relationship by controlling the material removal rate distribution on the surface of the planar part, thereby implementing the deterministic polishing of the planar part and ensuring the efficient convergence of the surface profile of the planar part in the polishing process. The present invention completes the high-precision polishing process by using the low-cost operation manner, thereby reducing the device cost.