METAL MASK
    1.
    发明公开
    METAL MASK 审中-公开

    公开(公告)号:US20240114758A1

    公开(公告)日:2024-04-04

    申请号:US17987195

    申请日:2022-11-15

    CPC classification number: H01L51/0011 C23C14/24 H01L51/001 H01L51/56

    Abstract: A metal mask has a first surface, a second surface opposite to the first surface, first and second openings provided on the first and second surfaces respectively, and first and second through holes communicating with the first and second openings respectively. The juncture of the first and second through holes further has an annular protrusion. The mask satisfies the in equations:






    1


    μm
    2

    FINE METAL MASK AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230167535A1

    公开(公告)日:2023-06-01

    申请号:US17669395

    申请日:2022-02-11

    CPC classification number: C23C14/042 H01L51/56 C23C14/24 G03F7/0015

    Abstract: A fine metal mask includes a plate including a first and a second surfaces. The first surface has a first inner edge defining a first opening. The second surface has a second inner edge defining a second opening communicated with the first opening. The plate includes a first and a second curved surfaces respectively connecting the first surface inside the first opening and the second surface inside the second opening. The first and the second curved surfaces connect with a third inner edge defining a third opening smaller than the first and the second openings. The third inner edge includes a first straight edge, a second straight edge and a circular edge. The first and the second straight edges form an included angle. The circular edge has a radius smaller than or equal to 15 microns and connects between the first and the second straight edges.

    Metal Mask
    3.
    发明公开
    Metal Mask 审中-公开

    公开(公告)号:US20240240301A1

    公开(公告)日:2024-07-18

    申请号:US18221909

    申请日:2023-07-14

    CPC classification number: C23C14/042 C23C14/24

    Abstract: A metal mask includes a metal body and a plurality of through-holes. The metal body has a first surface and a second surface, and the plurality of through-holes penetrate the metal body and respectively have openings on the first surface and the second surface, where each of the through-holes has a first opening, a second opening, and a third opening. The first opening is formed on the first surface; the second opening is formed on the second surface and is smaller than the first opening; the third opening is located within the through-hole and between the first opening and the second opening, and the third opening is smaller than the second opening. Each of the through-holes further has a first length and a second length, and the first length is greater than the second length.

    METHOD OF PREPARING METAL MASK SUBSTRATE

    公开(公告)号:US20220404695A1

    公开(公告)日:2022-12-22

    申请号:US17524076

    申请日:2021-11-11

    Abstract: A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.

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