公开(公告)号：US20090112520A1

公开(公告)日：2009-04-30

申请号：US11929338

申请日：2007-10-30

Applicant: DIMITRIS LYMBEROPOULOS ,  Robin Cheung

Inventor： DIMITRIS LYMBEROPOULOS ,  Robin Cheung

IPC: G06F15/00

CPC classification number: G06F11/24

Abstract: The present invention provides methods and apparatus for predictive maintenance of semiconductor process equipment. In some embodiments, a method for performing predictive maintenance on semiconductor processing equipment includes performing at least one self-diagnostic test on the semiconductor processing equipment with no substrate present in the equipment; comparing a result of the at least one self diagnostic test to at least one baseline characterization of the equipment; and determining whether equipment maintenance is required based upon the comparison.

Abstract translation: 本发明提供了用于半导体工艺设备的预测维护的方法和装置。 在一些实施例中，用于对半导体处理设备执行预测性维护的方法包括在半导体处理设备上执行至少一个自诊断测试，而不存在设备中的衬底; 将所述至少一个自诊断测试的结果与所述设备的至少一个基线表征进行比较; 并且基于比较来确定是否需要设备维护。