SURFACE TREATMENT DEVICE
    1.
    发明申请
    SURFACE TREATMENT DEVICE 有权
    表面处理装置

    公开(公告)号:US20120071069A1

    公开(公告)日:2012-03-22

    申请号:US13148407

    申请日:2010-02-03

    IPC分类号: B24B57/02

    CPC分类号: B24D13/10 B24B1/04 B24B57/02

    摘要: A surface treatment device includes an enclosure which has an opening through which the leading edge of an aerofoil passes. A sealing element is provided on the enclosure to seal the device to the surfaces of the aerofoil. An abrasive is located within the enclosure and two fluid openings are also provided through which a chemical accelerant can be pumped. In operation the enclosure is oscillated relative to the component so that material is abraded. Whilst the enclosure is oscillated a chemical accelerant is simultaneously pumped through it. The device allows for the local application of a surface treatment on a component.

    摘要翻译: 表面处理装置包括具有开口的外壳,机翼的前缘穿过该开口。 密封元件设置在外壳上以将装置密封到机翼的表面。 研磨剂位于外壳内,并且还提供两个流体开口,通过该开口可以泵送化学促进剂。 在操作中,外壳相对于部件振荡,使材料磨损。 当外壳振荡时,化学促进剂同时被泵送通过。 该装置允许在部件上局部施加表面处理。

    Surface treatment device
    3.
    发明授权
    Surface treatment device 有权
    表面处理装置

    公开(公告)号:US08651921B2

    公开(公告)日:2014-02-18

    申请号:US13148407

    申请日:2010-02-03

    IPC分类号: B24B7/00

    CPC分类号: B24D13/10 B24B1/04 B24B57/02

    摘要: A surface treatment device includes an enclosure which has an opening through which the leading edge of an aerofoil passes. A sealing element is provided on the enclosure to seal the device to the surfaces of the aerofoil. An abrasive is located within the enclosure and two fluid openings are also provided through which a chemical accelerant can be pumped. In operation the enclosure is oscillated relative to the component so that material is abraded. Whilst the enclosure is oscillated a chemical accelerant is simultaneously pumped through it. The device allows for the local application of a surface treatment on a component.

    摘要翻译: 表面处理装置包括具有开口的外壳,机翼的前缘穿过该开口。 密封元件设置在外壳上以将装置密封到机翼的表面。 研磨剂位于外壳内,并且还提供两个流体开口,通过该开口可以泵送化学促进剂。 在操作中,外壳相对于部件振荡,使材料磨损。 当外壳振荡时,化学促进剂同时被泵送通过。 该装置允许在组件上局部施加表面处理。