METHOD AND DEVICE FOR APPLYING A SURFACE STRUCTURING TO A WORKPIECE ON A MACHINE TOOL

    公开(公告)号:US20180036807A1

    公开(公告)日:2018-02-08

    申请号:US15671673

    申请日:2017-08-08

    Applicant: SAUER GmbH

    Inventor: Jens KETELAER

    Abstract: A method and a device applying surface structuring to a surface of a workpiece on a machine tool, performing a feed motion of a milling cutter which is rotationally driven by a work spindle of the machine tool, received in a tool head of the machine tool and has at least one protruding cutting edge along the surface of the workpiece; applying the surface structuring in accordance with a predetermined pattern to the surface of the workpiece during the feed motion of the milling cutter on the basis of a control signal to an actuator which is integrated in the tool head and is configured to drive a vibration of the milling cutter on the basis of the control signal, wherein the control signal contains high-frequency carrier signal and a useful signal which modulates the carrier signal and which is generated on the basis of data indicating the predetermined pattern.

    Computer numerical control machine tool for grinding two sides of a plane by shifting self-rotation and ultrasonic vibration
    8.
    发明授权
    Computer numerical control machine tool for grinding two sides of a plane by shifting self-rotation and ultrasonic vibration 有权
    计算机数控机床用于通过自转和超声波振动来研磨平面的两侧

    公开(公告)号:US09168625B2

    公开(公告)日:2015-10-27

    申请号:US13820975

    申请日:2011-09-08

    CPC classification number: B24B1/04 B24B7/17 B24B37/08 B24B41/067

    Abstract: A computer numerical control machine tool for grinding two sides of a plane by shifting self-rotation ultrasonic vibration, wherein a pillar (3) is provided on the tool body (1) of the machine tool, a Y axis movement assembly (12) is provided on the platform of the tool body (1), with a lower revolving movement assembly (11), which revolves about a Z coordinate axis, being mounted on the upper surface of the Y axis movement assembly (12), and a lower grinding plate (10) being mounted coaxially above the lower revolving movement assembly (11); an ultrasonic vibration assembly (2) is mounted fixedly on the pillar (3), with a separation plate (8) for clamping a workpiece assembly (9) being provided on the ultrasonic vibration assembly (2); an X axis movement assembly (4) is mounted on the upper part of the pillar (3), a Z axis movement assembly (5) is mounted on the upright face of the X axis movement assembly (4), with an upper revolving movement assembly (6), which revolves about the Z coordinate axis, being provided on the Z axis movement assembly (5), and an upper grinding plate (7) being mounted coaxially on the revolving axis of the upper revolving movement assembly (6). The present invention enhances the time variation of grinding movement tracks, the uniformity of grinding speed distribution, machining efficiency and machining precision.

    Abstract translation: 一种用于通过移动自旋超声波振动来研磨平面的两侧的计算机数字控制机床,其中在机床的工具主体(1)上设置有支柱(3),Y轴运动组件(12)是 设置在工具主体(1)的平台上,具有安装在Y轴运动组件(12)的上表面上的围绕Z坐标轴转动的下旋转运动组件(11),以及下磨 板(10)同轴地安装在下旋转运动组件(11)的上方; 超声波振动组件(2)固定地安装在支柱(3)上,具有用于夹紧设置在超声波振动组件(2)上的工件组件(9)的分隔板(8)。 X轴运动组件(4)安装在支柱(3)的上部,Z轴运动组件(5)安装在X轴运动组件(4)的直立面上,上运动组件 围绕Z坐标轴旋转的组件(6)设置在Z轴移动组件(5)上,以及同轴地安装在上部旋转运动组件(6)的旋转轴上的上部研磨板(7)。 本发明增加了研磨运动轨迹的时间变化,磨削速度分布的均匀性,加工效率和加工精度。

    METHODS AND SYSTEMS FOR VIBRATORY CHEMICAL MECHANICAL PLANARIZATION
    10.
    发明申请
    METHODS AND SYSTEMS FOR VIBRATORY CHEMICAL MECHANICAL PLANARIZATION 审中-公开
    振动化学机械平面化方法与系统

    公开(公告)号:US20150228511A1

    公开(公告)日:2015-08-13

    申请号:US14176545

    申请日:2014-02-10

    Inventor: Michael Wedlake

    CPC classification number: H01L21/30625 B24B1/04 B24B37/07

    Abstract: Methods and a system for processing semiconductor substrates are provided. A method of processing a semiconductor substrate includes selecting a predetermined vibration profile that will achieve predetermined material removal characteristics from the semiconductor substrate in a chemical mechanical planarization (CMP) polish, actuating a vibration actuator based on the predetermined vibration profile, and polishing the semiconductor substrate based substantially entirely on the predetermined vibration profile achieved by actuation of the vibration actuator.

    Abstract translation: 提供了用于处理半导体衬底的方法和系统。 一种处理半导体衬底的方法包括:在化学机械平面化(CMP)抛光中选择将从半导体衬底获得预定的材料去除特性的预定振动分布,基于预定的振动分布来致动振动致动器,以及研磨半导体衬底 基本上完全基于通过致动振动致动器实现的预定振动分布。

Patent Agency Ranking