PROCESS CHAMBER PRESSURE CONTROL SYSTEM AND METHOD
    1.
    发明申请
    PROCESS CHAMBER PRESSURE CONTROL SYSTEM AND METHOD 审中-公开
    过程室压力控制系统及方法

    公开(公告)号:US20130153045A1

    公开(公告)日:2013-06-20

    申请号:US13809610

    申请日:2010-07-14

    Inventor: Daniel J Vestyck

    Abstract: A method of and apparatus for controlling pressure in a process chamber having a continuous gas inlet flow and a continuous gas outlet flow comprising providing a pulsed valve at a gas outlet, a pressure gauge, and a programmable controller and varying the pulse rate of the pulsed valve, wherein either the open time or closed time, or both open and closed times, is lengthened or shortened, depending on whether the gauge pressure is above or below the programmed setpoint.

    Abstract translation: 一种用于控制具有连续气体入口流和连续气体出口流的处理室中的压力的​​方法和装置,包括在气体出口,压力计和可编程控制器处提供脉冲阀,并且改变脉冲 阀,其中打开时间或关闭时间,或打开和关闭时间都被延长或缩短,这取决于表压高于或低于编程设定值。

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