公开(公告)号：US07528386B2

公开(公告)日：2009-05-05

申请号：US11293903

申请日：2005-12-05

申请人： David N. Ruzic ,  Brian E. Jurczyk ,  Darren Alman ,  Martin J. Neumann ,  Huatan Qiu

发明人： David N. Ruzic ,  Brian E. Jurczyk ,  Darren Alman ,  Martin J. Neumann ,  Huatan Qiu

IPC分类号： G21G5/00

CPC分类号： H01L21/67069 ,  B08B6/00 ,  B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  C11D11/0047 ,  G03F1/82 ,  G03F7/0002 ,  G03F7/70925 ,  H01J2237/022 ,  H01L21/02046

摘要： A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels the particles off the surface. The cleaning process can be associated, for example, with microelectronic lithography and manufacturing.

摘要翻译： 用于非接触清洁表面颗粒污染的系统包括在表面和污染表面的颗粒之间产生电荷不平衡的一个或多个源，以及在表面上产生脉冲电偏压的电源。 这种不平衡产生了将颗粒推离表面的静电力。 清洁过程可以例如与微电子光刻和制造相关联。

公开(公告)号：US20060237667A1

公开(公告)日：2006-10-26

申请号：US11293903

申请日：2005-12-05

申请人： David Ruzic ,  Brian Jurczyk ,  Darren Alman ,  Martin Neumann ,  Huatan Qiu

发明人： David Ruzic ,  Brian Jurczyk ,  Darren Alman ,  Martin Neumann ,  Huatan Qiu

IPC分类号： G21G5/00 ,  A61N5/00

CPC分类号： H01L21/67069 ,  B08B6/00 ,  B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  C11D11/0047 ,  G03F1/82 ,  G03F7/0002 ,  G03F7/70925 ,  H01J2237/022 ,  H01L21/02046

摘要： A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels the particles off the surface. The cleaning process can be associated, for example, with microelectronic lithography and manufacturing.