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公开(公告)号:US4009037A
公开(公告)日:1977-02-22
申请号:US435175
申请日:1974-01-21
CPC分类号: C08J7/02 , B29D7/00 , G03C1/915 , G03C1/93 , C08J2325/04 , Y10S430/155
摘要: Improving the adhesion of a gelatin coating to a styrene homopolymer or copolymer film by solvent treating and corona discharge treating the film prior to coating with a gelatin layer in the production of a coated photobase.
摘要翻译: 通过溶剂处理和电晕放电改善明胶涂层对苯乙烯均聚物或共聚物膜的粘附性,在涂布光致抗蚀剂的基质之前用明胶层进行涂覆。