公开(公告)号：US06395363B1

公开(公告)日：2002-05-28

申请号：US08743308

申请日：1996-11-05

申请人： David S. Ballance ,  Benjamin Bierman ,  Robert M. Haney ,  David W. LaCourt

发明人： David S. Ballance ,  Benjamin Bierman ,  Robert M. Haney ,  David W. LaCourt

IPC分类号： C23C1600

CPC分类号： H01L21/68735 ,  H01L21/68757 ,  Y10T428/21 ,  Y10T428/213 ,  Y10T428/216 ,  Y10T428/218 ,  Y10T428/219 ,  Y10T428/31663

摘要： A substrate support comprising a shelf having a surface sloped at an angle such that the support contacts the substrate substantially at an edge portion of the substrate. The angle of the shelf is greater than an angle of the edge portion of the substrate. The surface of the shelf may be machined or polished to improve its smoothness. The substrate support thereby reduces the effect and severity of scratches on the substrate caused by the support. As a result, the substrate support improves substrate yield.

摘要翻译： 一种基板支撑件，其包括具有以一定角度倾斜的表面的搁架，使得支撑件基本上在基板的边缘部分处接触基板。 搁板的角度大于基板的边缘部分的角度。 搁板的表面可以被加工或抛光以提高其平滑度。 衬底支撑件因此降低了由支撑件引起的衬底划伤的影响和严重性。 结果，衬底支撑物改善了衬底产量。