公开(公告)号：US20080315134A1

公开(公告)日：2008-12-25

申请号：US11855849

申请日：2007-09-14

申请人： Dirk Heinrich EHM ,  Hermann Bieg ,  Hans-Juergen Mann ,  Stephan Muellender ,  Johannes Hubertus Josephina Moors ,  Bastian Theodor Wolschrijn

发明人： Dirk Heinrich EHM ,  Hermann Bieg ,  Hans-Juergen Mann ,  Stephan Muellender ,  Johannes Hubertus Josephina Moors ,  Bastian Theodor Wolschrijn

IPC分类号： A61N5/06 ,  G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/7085 ,  G03F7/70941

摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.

摘要翻译： 一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品 元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。 光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。