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    Embossing process including discrete and linear embossing elements
    1.
    发明授权
    Embossing process including discrete and linear embossing elements 有权
    压花工艺包括离散和线性压花元件

    公开(公告)号：US08083893B2

    公开(公告)日：2011-12-27

    申请号：US12171652

    申请日：2008-07-11

    申请人： Donn Nathan Boatman ,  Kevin Benson McNeil ,  David Mark Rasch ,  Kevin Mitchell Wiwi ,  Wayne Robert Fisher

    发明人： Donn Nathan Boatman ,  Kevin Benson McNeil ,  David Mark Rasch ,  Kevin Mitchell Wiwi ,  Wayne Robert Fisher

    IPC分类号： D21H27/02 ,  D21H27/40 ,  B31F1/07

    CPC分类号： B31F1/07 ,  B31F2201/0733 ,  B31F2201/0764 ,  Y10T428/24479 ,  Y10T428/24628

    摘要： A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.

    摘要翻译： 公开了一种用于生产深嵌套压纹产品的方法。 该方法包括以下步骤：a）提供具有配合的第一和第二压花构件的压花装置; b）以非随机图案向第一压花构件提供多个离散压花元件; c）向所述第二压花构件提供至少一个线性压花元件; d）使所述至少一个线性压花元件与所述第一压花元件的非随机图案协调; e）使第一压花构件和第二压花构件对准，使得第一压花元件的非随机图案与至少一个线性压花元件嵌套到大于约0.01mm的接合深度; f）向压花装置提供一层或多层材料; 以及g）使所述材料的所述一层或多层在所述第一和第二压花构件之间通过以产生深嵌套的压花产品。

    EMBOSSING PROCESS INCLUDING DISCRETE AND LINEAR EMBOSSING ELEMENTS
    3.
    发明申请
    EMBOSSING PROCESS INCLUDING DISCRETE AND LINEAR EMBOSSING ELEMENTS 有权
    包括离散和线性破坏元素的破坏过程

    公开(公告)号：US20080302493A1

    公开(公告)日：2008-12-11

    申请号：US12171652

    申请日：2008-07-11

    申请人： Donn Nathan Boatman ,  Kevin Benson McNeil ,  David Mark Rasch ,  Kevin Mitchell Wiwi ,  Wayne Robert Fisher

    发明人： Donn Nathan Boatman ,  Kevin Benson McNeil ,  David Mark Rasch ,  Kevin Mitchell Wiwi ,  Wayne Robert Fisher

    IPC分类号： D21H27/02

    CPC分类号： B31F1/07 ,  B31F2201/0733 ,  B31F2201/0764 ,  Y10T428/24479 ,  Y10T428/24628

    摘要： A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.

    摘要翻译： 公开了一种用于生产深嵌套压纹产品的方法。 该方法包括以下步骤：a）提供具有配合的第一和第二压花构件的压花装置; b）以非随机图案向第一压花构件提供多个离散压花元件; c）向所述第二压花构件提供至少一个线性压花元件; d）使所述至少一个线性压花元件与所述第一压花元件的非随机图案协调; e）使第一压花构件和第二压花构件对准，使得第一压花元件的非随机图案与至少一个线性压花元件嵌套到大于约0.01mm的接合深度; f）向压花装置提供一层或多层材料; 以及g）使所述材料的所述一层或多层在所述第一和第二压花构件之间通过以产生深嵌套的压花产品。

    Embossing process including discrete and linear embossing elements
    10.
    发明授权
    Embossing process including discrete and linear embossing elements 有权
    压花工艺包括离散和线性压花元件

    公开(公告)号：US07524404B2

    公开(公告)日：2009-04-28

    申请号：US11147873

    申请日：2005-06-08

    申请人： Donn Nathan Boatman ,  Kevin Benson McNeil ,  David Mark Rasch ,  Wayne Robert Fisher

    发明人： Donn Nathan Boatman ,  Kevin Benson McNeil ,  David Mark Rasch ,  Wayne Robert Fisher

    IPC分类号： D21H27/02 ,  D21H27/40 ,  B31F1/07

    CPC分类号： B31F1/07 ,  B31F2201/0733 ,  B31F2201/0764 ,  B44B5/0009 ,  B44B5/026 ,  Y10T156/1023 ,  Y10T428/24479 ,  Y10T428/24628

    摘要： An apparatus for producing an embossed product including a first embossing member having a plurality of discrete embossing elements disposed in a first non-random pattern having at least one first single pattern unit. The total area of the distal ends of the discrete embossing elements in the first single pattern unit is less than about 5.0 cm2. The apparatus also includes a second embossing member having a plurality of linear embossing elements disposed in a second non-random pattern having at least one second single pattern unit. The total area of the second distal ends in the second single pattern unit is less than about 10 cm2. The second non-random pattern is coordinated with the first non-random pattern such that when engaged with each other the first single pattern unit and the second single pattern unit make up an embossing pattern single pattern unit.

    摘要翻译： 一种用于生产压花产品的装置，包括具有以具有至少一个第一单一图案单元的第一非随机图案布置的多个离散压花元件的第一压花部件。 第一单一图案单元中离散压花元件的远端的总面积小于约5.0cm 2。 该装置还包括第二压花构件，其具有以具有至少一个第二单一图案单元的第二非随机图案设置的多个线性压花元件。 第二单一图案单元中的第二远端的总面积小于约10cm 2。 第二非随机图案与第一非随机图案协调，使得当彼此接合时，第一单个图案单元和第二单个图案单元组成压花图案单一图案单元。