SCANNING MICROSCOPY USING INHOMOGENEOUS POLARIZATION
    1.
    发明申请
    SCANNING MICROSCOPY USING INHOMOGENEOUS POLARIZATION 有权
    扫描显微镜使用非均匀偏振

    公开(公告)号:US20090284835A1

    公开(公告)日:2009-11-19

    申请号:US12464761

    申请日:2009-05-12

    IPC分类号: G02B27/28

    CPC分类号: G02B21/0092 G02B21/0068

    摘要: Apparatus for imaging a surface, including an acousto-optic (AO) system. The AO system includes an AO element having a radiation input surface and a radiation output surface. The element is configured to receive radio-frequency (RF) pulses and a radiation input at the radiation input surface and to generate traveling beams from the radiation output surface. The AO system also includes an inhomogeneous polarization generator, positioned relative to the AO element so that the AO system outputs traveling inhomogeneously polarized beams. The apparatus includes objective optics which are configured to focus the inhomogeneously polarized beams onto the surface so as to form respective traveling spots thereon; collection optics, which are configured to collect scattered radiation from the traveling spots and to focus the scattered radiation to form respective image spots; and a detector which is arranged to receive the respective image spots and to generate a signal in response thereto.

    摘要翻译: 用于对表面进行成像的装置,包括声光(AO)系统。 AO系统包括具有辐射输入表面和辐射输出表面的AO元件。 该元件被配置为在辐射输入表面处接收射频(RF)脉冲和辐射输入并且产生来自辐射输出表面的行进光束。 AO系统还包括相对于AO元件定位的不均匀偏振发生器,使得AO系统输出行进的非均匀偏振光束。 该装置包括被配置为将不均匀偏振光束聚焦到表面上以在其上形成相应的行进点的物镜光学元件; 收集光学器件,其被配置为从所述行进点收集散射的辐射并且聚焦所述散射的辐射以形成相应的图像斑点; 以及检测器,其被布置成接收相应的图像点并响应于此产生信号。

    Scanning microscopy using inhomogeneous polarization
    2.
    发明授权
    Scanning microscopy using inhomogeneous polarization 有权
    扫描显微镜使用不均匀的极化

    公开(公告)号:US08228601B2

    公开(公告)日:2012-07-24

    申请号:US12464761

    申请日:2009-05-12

    IPC分类号: G02B27/28

    CPC分类号: G02B21/0092 G02B21/0068

    摘要: Apparatus for imaging a surface, including an acousto-optic (AO) system. The AO system includes an AO element having a radiation input surface and a radiation output surface. The element is configured to receive radio-frequency (RF) pulses and a radiation input at the radiation input surface and to generate traveling beams from the radiation output surface. The AO system also includes an inhomogeneous polarization generator, positioned relative to the AO element so that the AO system outputs traveling inhomogeneously polarized beams. The apparatus includes objective optics which are configured to focus the inhomogeneously polarized beams onto the surface so as to form respective traveling spots thereon; collection optics, which are configured to collect scattered radiation from the traveling spots and to focus the scattered radiation to form respective image spots; and a detector which is arranged to receive the respective image spots and to generate a signal in response thereto.

    摘要翻译: 用于对表面进行成像的装置,包括声光(AO)系统。 AO系统包括具有辐射输入表面和辐射输出表面的AO元件。 该元件被配置为在辐射输入表面处接收射频(RF)脉冲和辐射输入并且产生来自辐射输出表面的行进光束。 AO系统还包括相对于AO元件定位的不均匀偏振发生器,使得AO系统输出行进的非均匀偏振光束。 该装置包括被配置为将不均匀偏振光束聚焦到表面上以在其上形成相应的行进点的物镜光学元件; 收集光学器件,其被配置为从所述行进点收集散射的辐射并且聚焦所述散射的辐射以形成相应的图像斑点; 以及检测器,其被布置成接收相应的图像点并响应于此产生信号。

    Polishing fixture for simultaneous loading of a plurality of optical connectors and fiber stubs and a method of loading
    3.
    发明申请
    Polishing fixture for simultaneous loading of a plurality of optical connectors and fiber stubs and a method of loading 审中-公开
    用于同时加载多个光学连接器和光纤短截线的抛光夹具和一种装载方法

    公开(公告)号:US20050260932A1

    公开(公告)日:2005-11-24

    申请号:US10851119

    申请日:2004-05-24

    摘要: A fixture for simultaneously clamping a number of optical fiber ferrules or fiber stubs for polishing. The fixture includes a plate assembly with an upper surface, a lower surface and a number of ferrule-receiving bores disposed across the upper surface and extending from the upper surface to the lower surface, each ferrule-receiving bore for receiving a ferrule. The fixture further includes a number of ferrule gripper arrangements, each associated with one of the ferrule-receiving bores, each of the ferrule gripper arrangements being selectively deployable between a released state for insertion of a ferrule into the ferrule-receiving bore and a gripping state in which the gripper arrangement clamps a ferrule within the ferrule-receiving bore. The fixture also includes a locking mechanism associated with at least a group of the number of ferrule gripper arrangements and configured to deploy the group of ferrule gripper arrangements substantially simultaneously from the released state to the gripping state so as to clamp substantially simultaneously a number of optical fiber ferrules located within a corresponding group of the ferrule-receiving bores.

    摘要翻译: 用于同时夹紧多个用于抛光的光纤套圈或纤维短截线的夹具。 固定装置包括具有上表面的板组件,下表面和多个套圈接纳孔,其跨过上表面设置并且从上表面延伸到下表面,每个套圈接收孔用于接纳套圈。 夹具还包括多个套圈夹持装置,每个套圈夹持装置与套管接收孔中的一个相关联,每个套圈夹持装置可选择地展开在用于将套圈插入套圈容纳孔的释放状态和夹紧状态 其中夹具装置将套圈夹在套圈容纳孔内。 夹具还包括与至少一组数量的套圈夹持器装置相关联的锁定机构,并且构造成将套管夹持器组合基本上同时地从释放状态展开到抓握状态,以便基本同时夹紧多个光学 光纤套圈位于相应的套圈接收孔组内。

    Precision polishing system
    5.
    发明授权
    Precision polishing system 失效
    精密抛光系统

    公开(公告)号:US5741171A

    公开(公告)日:1998-04-21

    申请号:US699309

    申请日:1996-08-19

    摘要: A precision polishing system able to polish samples to an accuracy within the submicron range is disclosed. The novel polishing system has applications in the semiconductor field for use in polishing silicon wafers during testing and quality control inspections. In the examination of failed wafers during the semiconductor manufacturing process, it is desirable to examine a cross section of the wafer at the point of failure. The polishing system of the present invention enables very accurate polishing of the wafer down to the submicron accuracy range. The sample is held is place by a gripper assembly which is attached to a polishing arm slideably connected to a fixed rail. The polishing arm is raised and lowered to polish the sample using a polishing wheel covered with a suitable abrasive. A video microscope attached to an object lens and a video camera provide images that are processed to control the polishing operation. The video microscope is mounted on a precision X-Y table to facilitate focusing and defect location of the sample in addition to forming part of the closed loop control of the polishing process. Two closed loop feedback control methods are utilized by the invention to achieve high polishing accuracies. The first utilizes electromechanical means to perform rough polishing of the sample. The second method utilizes digital image processing techniques to accurately control the movement of a polishing arm which holds the sample as it is polished.

    摘要翻译: 公开了一种能够将样品抛光到亚微米范围内的精度的精密抛光系统。 该新型抛光系统在半导体领域中的应用可用于在测试和质量控制检查期间抛光硅晶片。 在半导体制造过程中检查失败晶片时,期望在故障点检查晶片的横截面。 本发明的抛光系统能够将晶片非常精确地抛光到亚微米精度范围。 通过夹持器组件保持样品的位置,该夹持器组件附接到可滑动地连接到固定轨道的抛光臂。 使用覆盖有合适磨料的抛光轮将抛光臂升高和降低以对样品进行抛光。 附接到物镜和摄像机的视频显微镜提供被处理以控制抛光操作的图像。 视频显微镜安装在精密X-Y台上,以便于形成样品的聚焦和缺陷位置,同时形成抛光过程的闭环控制的一部分。 本发明利用两个闭环反馈控制方法实现高抛光精度。 第一种使用机电装置来对样品进行粗糙的抛光。 第二种方法利用数字图像处理技术精确地控制在抛光时保持样品的抛光臂的运动。