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公开(公告)号：US09588438B2
公开(公告)日：2017-03-07
申请号：US13293116
申请日：2011-11-09
申请人： Duan-Fu Hsu , Luoqi Chen , Hanying Feng , Rafael C. Howell , Xinjian Zhou , Yi-Fan Chen
发明人： Duan-Fu Hsu , Luoqi Chen , Hanying Feng , Rafael C. Howell , Xinjian Zhou , Yi-Fan Chen
CPC分类号： G03F7/70066 , G03F7/705
摘要： Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. The projection optics may be used to shape wavefront in the lithographic projection apparatus, enabling aberration control of the overall imaging process.
摘要翻译： 本发明的实施例提供了优化包括优化其中的投影光学元件的光刻投影装置的方法。 目前的实施例包括几个流程，包括优化源，掩模和投影光学器件以及组合投影光学元件，掩模和源中的任何一个的各种顺序和迭代优化步骤。 投影光学器件有时被广泛地称为“透镜”，因此优化过程可以被称为源掩模透镜优化（SMLO）。 SMLO可能比现有的源掩码优化过程（SMO）或其他不包括投影光学优化的优化过程更为理想，部分原因是在优化中包括投影光学器件可能会导致更大的工艺窗口，通过引入多个可调整的特性 投影光学。 投影光学元件可用于在光刻投影设备中形成波前，从而实现整个成像过程的像差控制。
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公开(公告)号：US20120113404A1
公开(公告)日：2012-05-10
申请号：US13293116
申请日：2011-11-09
申请人： Duan-Fu Hsu , Luoqi Chen , Hanying Feng , Rafael C. Howell , Xinjian Zhou , Yi-Fan Chen
发明人： Duan-Fu Hsu , Luoqi Chen , Hanying Feng , Rafael C. Howell , Xinjian Zhou , Yi-Fan Chen
IPC分类号： G03B27/54
CPC分类号： G03F7/70066 , G03F7/705
摘要： Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. The projection optics may be used to shape wavefront in the lithographic projection apparatus, enabling aberration control of the overall imaging process.
摘要翻译： 本发明的实施例提供了优化包括优化其中的投影光学元件的光刻投影装置的方法。 目前的实施例包括几个流程，包括优化源，掩模和投影光学器件以及组合投影光学元件，掩模和源中的任何一个的各种顺序和迭代优化步骤。 投影光学器件有时被广泛地称为“透镜”，因此优化过程可以被称为源掩模透镜优化（SMLO）。 SMLO可能比现有的源掩码优化过程（SMO）或其他不包括投影光学优化的优化过程更为理想，部分原因是在优化中包括投影光学器件可能会导致更大的工艺窗口，通过引入多个可调整的特性 投影光学。 投影光学元件可用于在光刻投影设备中形成波前，从而实现整个成像过程的像差控制。
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公开(公告)号：US08898599B2
公开(公告)日：2014-11-25
申请号：US13904867
申请日：2013-05-29
申请人： Xiaofeng Liu , Rafael C. Howell
发明人： Xiaofeng Liu , Rafael C. Howell
CPC分类号： G06F17/5068 , G03F1/70 , G03F7/70125 , G03F7/70483 , G03F7/705
摘要： Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient.
摘要翻译： 本文描述了一种用于使用光刻成像装置将设计布局的一部分成像到基板上的光刻工艺的方法，所述光刻工艺具有多个设计变量，所述方法包括：计算多个评估中的每一个的梯度 关于至少一个设计变量的光刻工艺的点或图案; 以及基于所述梯度从所述多个评估点或模式中选择评估点的子集。
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公开(公告)号：US20130326437A1
公开(公告)日：2013-12-05
申请号：US13904867
申请日：2013-05-29
申请人： Xiaofeng LIU , Rafael C. Howell
发明人： Xiaofeng LIU , Rafael C. Howell
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/70 , G03F7/70125 , G03F7/70483 , G03F7/705
摘要： Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient.
摘要翻译： 本文描述了一种用于使用光刻成像装置将设计布局的一部分成像到基板上的光刻工艺的方法，所述光刻工艺具有多个设计变量，所述方法包括：计算多个评估中的每一个的梯度 关于至少一个设计变量的光刻工艺的点或图案; 以及基于所述梯度从所述多个评估点或模式中选择评估点的子集。
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