摘要:
WHERE R is a lower alkyl group of 1 to 4 carbon atoms and R1 is an alkylidene, aralkylidene or heterocyclic group.
There is described a novel group of light-sensitive copolyesters prepared by condensing at least one alkylene glycol of 2 to 12 carbon atoms with a mixture of bis-esters of dicarboxylic acids, from 30 to 70 mole percent of the bis-esters being the bis-ester of non-light-sensitive aromatic dicarboyxlic acid selected from terephthalic acid and isophthalic acid and from 70 to 30 mole percent of the bis-esters being a light-sensitive bis-ester having the formula:
摘要:
NOVEL ALKALI-SOLUBLE LIGHT SENSITIVE POLYMERS ARE PREPARED BY A PROCESS INVOLVING THE CONTROLLED SAPONIFICATION OF A LIGHT SENSITIVE POLYESTER WHICH HAS BEEN PREPARED BY CONDENSATION OF A POLYMER CONTAINING GROUPS, SUCH AS HYDROXYL OR AMINO GROUPS, CONDENSIBLE WITH A LIGHT SENSITIVE DICARBOXYLIC ACID REACTANT WHEREIN ONE OF THE CARBOXYL GROUPS HAS BEEN BLOCKED BY CONVERSION TO THE ESTER, E.G., WITH THE HALF ESTER-HALF ACID CHLORIDE OF THE LIGHT SENSITIVE DICARBOXYLIC ACID. THESE ALKALI-SOLUBLE POLYMERS ARE USEFUL IN PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS TO PREPARE PHOTOMECHANICAL IMAGES SUCH AS LITHOGRAPHIC PRINTING PLATES, RESISTS, AND THE LIKE.
摘要:
NOVEL LIGHT-SENSITIVE POLYMERS CONTAIN AS THE LIGHT-SENSITIVE MOIETY A SIDE CHAIN WHICH CONTAINS TOW ETHYLENICALLY UNSATURATED GROUPS CONJUGATED TO EACH OTHER THROUGH AN ARYLENE GROUP. PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS PREPARED WITH THESE POLYMERS ARE USEFUL IN THE PREPARATION OF PHOTOMECHANICAL IMAGES SUCH AS PHOTORESISTS AND LITHOGRAPHIC PRINTING PLATES.