公开(公告)号：US20140251565A1

公开(公告)日：2014-09-11

申请号：US13791627

申请日：2013-03-08

Applicant: ECOLAB USA INC.

Inventor： Jane B. Wong Shing ,  Zhi Chen ,  Dennis MacDonald ,  Ronald S. Doles ,  Wen Bai

IPC: C01B33/158

CPC classification number: C01B33/148 ,  C01P2006/12 ,  D21H17/68 ,  D21H21/10

Abstract: The invention provides a method for improving the effectiveness of colloidal silica. The method involves removing enough charged impurities from the colloid to prevent the charged particles from causing the colloid to become a viscous gel. The method however also involves not removing too many charged particles so the silica material doesn't gel by cross-linking with itself. This method is quite effective because it recognizes that materials that have accumulated during the formation of the colloid do perform an important function, but they can perform better at a lower concentration.

Abstract translation: 本发明提供一种提高胶态二氧化硅的有效性的方法。 该方法包括从胶体中除去足够的带电杂质以防止带电粒子引起胶体变成粘性凝胶。 然而，该方法也不包括不去除太多的带电粒子，因此二氧化硅材料不会通过与其自身交联而凝胶化。 这种方法是非常有效的，因为它认识到在胶体形成期间积累的材料确实具有重要功能，但是它们可以在较低浓度下表现更好。

公开(公告)号：US10087081B2

公开(公告)日：2018-10-02

申请号：US13791627

申请日：2013-03-08

Applicant: Ecolab USA Inc.

Inventor： Jane B. Wong Shing ,  Zhi Chen ,  Dennis MacDonald ,  Ronald S. Doles ,  Wen Bai ,  Raymond D. Miller, Jr.

IPC: D21H17/68 ,  D21H21/10 ,  C01B33/148

Abstract: The invention provides a method for improving the effectiveness of colloidal silica. The method involves removing enough charged impurities from the colloid to prevent the charged particles from causing the colloid to become a viscous gel. The method however also involves not removing too many charged particles so the silica material doesn't gel by cross-linking with itself. This method is quite effective because it recognizes that materials that have accumulated during the formation of the colloid do perform an important function, but they can perform better at a lower concentration.

公开(公告)号：US09975781B2

公开(公告)日：2018-05-22

申请号：US15105801

申请日：2014-12-17

Applicant: ECOLAB USA INC.

Inventor： Wen Bai ,  Jian Xu ,  Jia Wu ,  Zhi Chen ,  Jian Kun Shen ,  Raymond D. Miller, Jr. ,  Jane B. Wong Shing

IPC: D21H21/10 ,  C01B33/146 ,  D21H17/68 ,  B01J13/00 ,  D21H11/02 ,  C09C1/30

CPC classification number: C01B33/146 ,  B01J13/00 ,  C09C1/3045 ,  C09C1/3063 ,  D21H11/02 ,  D21H17/68 ,  D21H21/10

Abstract: The present invention relates to colloidal silicas having a low S-value and a high solids content, the preparation thereof, and the use thereof in the production of paper. When used in the production of paper, the colloidal silicas of the invention exhibit good retention and drainage performance so that they can be used in lower amounts compared to conventional colloidal silicas. The present invention also relates to an apparatus and a method for producing such activated colloidal silicas.