公开(公告)号：US20250003057A1

公开(公告)日：2025-01-02

申请号：US18754112

申请日：2024-06-25

Applicant: ENTEGRIS, INC.

Inventor： Weihang Guan ,  Sanado Barolli ,  Ying Tang ,  Edward E. Jones ,  Kavita R. Murthi ,  Sharona R. Kay

IPC: C23C14/48 ,  C23C14/54 ,  H01L21/265 ,  H01L21/66

Abstract: A delivery system for delivering a vaporized source precursor in ion implantation, including: an assembly including: a vessel having an interior volume and configured to produce the vaporized source precursor; a first heater to heat the vessel; and a manifold configured to control the output of the vaporized source precursor to an ion implantation device, wherein the assembly is configured to be disposed upstream of the source inlet flange.