公开(公告)号：US10254447B2

公开(公告)日：2019-04-09

申请号：US14364401

申请日：2012-12-14

Applicant: ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)

Inventor： Florence Legrand ,  Robert Pellegris ,  Vincent Roblot ,  Laurent Marcepoil ,  Sebastien Maurice ,  Frederic Dubois

IPC: G02B3/00 ,  B29D11/00

Abstract: A system and method of generating machine marking instructions for marking an ophthalmic lens is disclosed. The method comprises the steps of receiving lens order data related to a lens order, receiving an initial marking layout and calculating, using the lens order data, ophthalmic lens data of an ophthalmic lens related to the lens order. The method also comprises the steps of determining, using the ophthalmic lens data, marking parameters relating to the ophthalmic lens, producing an additional marking layout by modifying the initial marking layout using the marking parameters and the lens order data, the additional marking layout representing the markings to be applied to the ophthalmic lens, and generating machine marking instructions arranged to cause a marking machine to mark the ophthalmic lens in accordance with the additional marking layout.

公开(公告)号：US10112340B2

公开(公告)日：2018-10-30

申请号：US14917113

申请日：2014-09-19

Applicant: ESSILOR INTERNATIONAL (Compagnie Generale d'Optique)

Inventor： Sebastien Maurice ,  Frederic Dubois

IPC: B29C59/16 ,  B29D11/00 ,  B23K26/00 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/361 ,  B23K103/00

Abstract: A device for marking an ophthalmic lens (3), the lens (3) being made of at least one preset material, includes a laser (1) configured to produce permanent engravings on the lens (3) and configured to emit a focused beam of pulsed ultraviolet laser radiation that includes at least one radiation wavelength ranging between 200 nm and 300 nm, has a pulse length ranging between about 0.1 ns and about 5 ns, and has an energy per pulse ranging between about 5 μJ and about 100 μJ. A laser marking process configured to produce permanent engravings on an ophthalmic lens (3) via this device is also described.

公开(公告)号：US10543566B2

公开(公告)日：2020-01-28

申请号：US14898711

申请日：2014-06-25

Applicant: ESSILOR INTERNATIONAL (Compagnie Generale d'Optique)

Inventor： Frederic Dubois ,  Sebastien Maurice

IPC: B23K26/362 ,  B23K26/402 ,  G02C7/02

Abstract: A method for producing an ophthalmic lens includes a step of laser marking in order to produce permanent etchings on one surface of the lens, at least one predefined step subsequent to the marking step and implementing extreme thermal stress that is applied to the surface, and a step of determining an operating point (PF) of a laser marking machine (1) configured to implement the marking step from geometric characteristics (Di) of the etchings to be made, the determining step including the steps of determining (304) a value (CPM) representative of the deformation of the lens on at least one treatment area of the surface, from the stress and data relative to a predetermined material from which the lens is formed, and of deducing (308) the operating point from the value representative of deformation and from the geometric characteristics.