公开(公告)号：US10939738B2

公开(公告)日：2021-03-09

申请号：US16799555

申请日：2020-02-24

Applicant: Elementree Inc.

Inventor： Renuka Ajay Apte ,  Aaron James Feldstein ,  Erik Oscar Sunden

IPC: B41J3/407 ,  B41M1/40 ,  A45D29/14

Abstract: The present disclosure relates to a robotic apparatus and methods for automatic nail polish application on natural or artificial finger or toe nails.

公开(公告)号：US20240251925A1

公开(公告)日：2024-08-01

申请号：US18430541

申请日：2024-02-01

Applicant: Elementree Inc.

Inventor： Renuka Ajay Apte ,  Aaron James Feldstein ,  Erik Oscar Sunden ,  Christopher Sean Masterson

IPC: A45D29/00 ,  B08B1/16

CPC classification number: A45D29/007 ,  B08B1/165

Abstract: The present disclosure relates to automated systems for nail services, including blotting, nail polish removal, nail polish storage and display, etc. In some embodiments, the systems work in conjunction with or are part of a robotic apparatus for automatic nail polish application or removal on natural or artificial finger or toenails.

公开(公告)号：US20200268125A1

公开(公告)日：2020-08-27

申请号：US16799555

申请日：2020-02-24

Applicant: Elementree Inc.

Inventor： Renuka Ajay Apte ,  Aaron James Feldstein ,  Erik Oscar Sunden

IPC: A45D29/14

Abstract: The present disclosure relates to a robotic apparatus and methods for automatic nail polish application on natural or artificial finger or toe nails.