FABRICATION OF SELF ASSEMBLING NANO-STRUCTURES
    3.
    发明申请
    FABRICATION OF SELF ASSEMBLING NANO-STRUCTURES 审中-公开
    自组装纳米结构的制造

    公开(公告)号:US20080075928A1

    公开(公告)日:2008-03-27

    申请号:US11857967

    申请日:2007-09-19

    IPC分类号: B32B1/00 B05D5/00

    摘要: A new approach to fabricating regularly patterned nano-scale structures, by self assembly of the structures is disclosed, where a pattern of nano-lines are deposited on a substrate and nano-structures are grown by self assembly in regions between the lines to form regular or patterned nano-scale structures, which are ideally suited for the construction nano-scale materials, nano-scale electronic devices and other nano-scale objects, apparatuses or devices. The invention also relates to methods of making and using same.

    摘要翻译: 公开了通过结构的自组装制造规则图案的纳米尺度结构的新方法,其中纳米线的图案沉积在衬底上并且纳米结构通过自组装在线之间的区域中生长以形成规则 或图案化纳米尺度结构,其理想地适用于构造纳米级材料,纳米级电子器件和其它纳米尺度物体,装置或器件。 本发明还涉及制造和使用它们的方法。