Accurately monitored CMP recycling
    1.
    发明授权
    Accurately monitored CMP recycling 有权
    准确监测CMP回收

    公开(公告)号:US09050851B2

    公开(公告)日:2015-06-09

    申请号:US13952861

    申请日:2013-07-29

    CPC classification number: B44C1/227 B24B57/00

    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.

    Abstract translation: 提供了一种用于重新配制化学机械平面化(CMP)浆料的方法,该化学机械平面化(CMP)浆料与CMP工具结合使用,CMP刀具具有工具用于平坦化基材的活动循环,以及冲洗工具的漂洗循环。 该方法包括(a)从CMP工具接收进料流,所述进料流的至少一部分包含设置在液体介质中的磨料颗粒; (b)在冲洗循环的至少一部分期间,将从CMP工具接收的进料流发送到第一位置; 和(c)在活动循环的至少一部分期间,将从CMP工具接收的进料流发送到第二位置,在该第二位置,进料流经过处理以重新配制浆料。

    Accurately Monitored CMP Recycling
    2.
    发明申请
    Accurately Monitored CMP Recycling 有权
    准确监测的CMP回收

    公开(公告)号:US20130306600A1

    公开(公告)日:2013-11-21

    申请号:US13952861

    申请日:2013-07-29

    CPC classification number: B44C1/227 B24B57/00

    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.

    Abstract translation: 提供了一种用于重新配制化学机械平面化(CMP)浆料的方法,该化学机械平面化(CMP)浆料与CMP工具结合使用,CMP刀具具有工具用于平坦化基材的活动循环,以及冲洗工具的漂洗循环。 该方法包括(a)从CMP工具接收进料流,所述进料流的至少一部分包含设置在液体介质中的磨料颗粒; (b)在冲洗循环的至少一部分期间,将从CMP工具接收的进料流发送到第一位置; 和(c)在活动循环的至少一部分期间,将从CMP工具接收的进料流发送到第二位置,在该第二位置,进料流经过处理以重新配制浆料。

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